 |
|
|
|
以作者查詢圖書館館藏 、以作者查詢臺灣博碩士 、以作者查詢全國書目 、勘誤回報 、線上人數：49 、訪客IP：3.23.103.216
姓名 謝明倫(Ming-lun Hsieh) 查詢紙本館藏 畢業系所 光電科學與工程學系 論文名稱 薄膜式規則性多孔陽極氧化鋁膜製作
(Fabrication of thin-film type anodic aluminum oxide films by multi-step anodization)相關論文 檔案 [Endnote RIS 格式]
[相關文章]
[文章引用]
[完整記錄]
[館藏目錄]
[檢視]
- 本電子論文使用權限為同意立即開放。
- 已達開放權限電子全文僅授權使用者為學術研究之目的，進行個人非營利性質之檢索、閱讀、列印。
- 請遵守中華民國著作權法之相關規定，切勿任意重製、散佈、改作、轉貼、播送，以免觸法。
摘要(中) 摘要
本篇論文利用多次陽極處理及移除氧化鋁步驟在鋁箔及鋁薄膜上製造出高規則性陽極氧化鋁膜(anodic aluminium oxide, AAO)，在柔軟的鋁箔上，AAO模板製作的光學元件可能被損壞，所以鋁箔基板上不適宜元件製作，無法達到很好的利用。嘗試將鋁箔式規則陽極氧化鋁實驗方式應用於玻璃基板鋁膜上的AAO成長，玻璃上的鋁膜鍍製方式可分為電子槍蒸鍍、磁控濺鍍以及多股鎢絲蒸鍍三種方式。在膜厚較薄的鋁膜，表面粗糙度會影響初期的孔洞形成，且陽極處理的時間不足會使得孔洞的穩定成長無法達成，因此選擇表面粗糙度較佳的磁控濺鍍以及多股鎢絲蒸鍍兩種鍍膜方式，鍍製膜厚較厚的鋁膜。最後得到的厚鋁膜，其陽極處理時間可被延長，以達到孔洞的穩定成長，經過多次陽極處理及移除氧化鋁步驟，孔洞規則度可大為改善。
移除時間的控制對於AAO表面孔洞規則度有很大影響，移除時間要控制在剛好把前一層氧化鋁完全移除，使得前一層阻障層會在鋁基板表面留下半圓形凹槽，此凹槽是孔洞自我組織可調整到的最規則位置，凹槽除了可使下一次陽極處理時能有好的初始表面以利電場分布，也使得製造出的陽極氧化鋁膜，從膜層表面到底部都能達到一致的規則性
利用此電化學方式可在玻璃基板上獲得大面積、製程便宜的高規則度AAO模板。此製程AAO孔洞直徑可調範圍30 ~ 100 nm。此AAO模板製程可被應用來製作奈米尺寸的孔洞、管材和線材之陣列，以形成二維光子晶體之結構，或以AAO為基板，利用自我複製法(autocloning)製作三維光子晶體結構。摘要(英) Abstract
In this thesis the multi-anodization was applied to fabricate self-organized nanoporous anodic aluminum oxide (AAO) from the foils and the films of aluminum. AAO is unsuitable to be constructed optical devices for its property of easily crack when fabricated on the soft aluminum foils. So, the thin-film type of AAO templates was developed and fabricated on a glass substrate by multi-anodizations. The depositions of the aluminum films on the glass substrates were made by three different methods: E-gun deposition, magnetron sputtering deposition, and resistive heating deposition.
The thicker thickness and the smoother surface of the aluminum films would assist AAO templates to get the better periodic arrangement. The initial pores of AAO were dependent on the surface roughness of the aluminum films. When the aluminum film was too thin the AAO process was unable to reach the stable growth status. For the reason of getting better surface roughness than the E-gun deposition, the magnetron sputtering deposition and the resistive heating deposition were chosen to deposit the aluminum film. Besides, by repeating the anodization process, the AAO templates will get the better periodic arrangement than only by one anodization process.
The AAO template technique is very cheap and can obtain large useful area during the process. The diameters of the pores were adjustable between 30nm to 90nm. It can be applied to the fabrication of two- or three dimension photonic crystal devices.關鍵字(中) ★ 電化學
★ 陽極氧化鋁
★ 陽極處理
★ 奈米孔洞關鍵字(英) ★ Electrochemical
★ AAO
★ nanopore
★ anodize論文目次 目錄
英文摘要.......................................................................................................................... .I
中文摘要 ......................................................................................................................... II
誌謝...................................................................................................................................III
目錄...................................................................................................................................IV
圖目錄...............................................................................................................................VI
表目錄.............................................................................................................................VIII
第一章 緒論...................................................................................................................1
1.1研究動機.......................................................................................................................1
第二章 多孔性陽極氧化鋁膜..................................................................................2
2.1多孔性陽極氧化鋁膜簡介............................................................................................2
2.2多孔性陽極氧化鋁膜形成機制....................................................................................5
2.3陽極氧化鋁成形之化學反應........................................................................................8
2.4陽極氧化鋁的應用.......................................................................................................10
2.4.1 不規則排列陽極氧化鋁應用............................................................................11
2.4.2規則排列陽極氧化鋁應用..................................................................................13
第三章 實驗儀器與量測設備.................................................................................14
3.1實驗儀器......................................................................................................................14
3.1.1陽極處理實驗裝置............................................................................................14
3.1.2電子槍蒸鍍機(E-Beam Gun Evaporation System)............................................15
3.1.3磁控濺鍍機(Magnetron Sputter)........................................................................16
3.2量測儀器......................................................................................................................17
3.2.1掃描式電子顯微鏡(Scanning Electron Microscopy )量測原理........................17
3.2.2原子力顯微鏡(Atomic Force Microscopy ; AFM)量測原理.............................20
3.2.3光譜儀 (Spectrophtometer) ...............................................................................23
3.3試劑及其來源..............................................................................................................24
第四章 鋁箔式陽極氧化鋁......................................................................................25
4.1 實驗原理....................................................................................................................25
4.2 實驗步驟....................................................................................................................26
4.2.1電解拋光............................................................................................................27
4.2.2陽極處理............................................................................................................27
4.2.3孔洞擴大步驟.....................................................................................................27
4.3實驗結果與討論..........................................................................................................28
4.3.1實驗結果.............................................................................................................28
4.3.2實驗討論.............................................................................................................31
4.4結論..............................................................................................................................35
第五章 薄膜式陽極氧化鋁......................................................................................36
5.1 實驗原理....................................................................................................................36
5.2 實驗步驟 ..................................................................................................................36
5.2.1 鍍製鋁膜...........................................................................................................37
5.2.2薄膜陽極處理....................................................................................................37
5.3實驗結果與討論..........................................................................................................38
5.3.1表面粗糙度對陽極處理影響.............................................................................38
5.3.2表面粗糙度對薄膜式陽極處理影響 實驗結果 ..............................................45
5.3.3表面粗糙度對薄膜式陽極處理影響 實驗討論………...….………...............48
5.3.4鋁膜厚度對孔洞規則度的改善 實驗結果........................................................49
5.3.5鋁膜厚度對孔洞規則度的改善 實驗討論........................................................52
5.3.6結論.....................................................................................................................53
第六章 總結..................................................................................................................54
參考文獻........................................................................................................................55參考文獻 參考文獻
【1】S.B.Lee, D.T. Mitchell, L.Trofin, T.K.Nevanen, H. öderlund,
C.R.Martin, “Antibody-Based Bio-Nanotube Membranes for
EnantiomericDrug Separations”, Science,296,2198, 2002.
【2】S. Z. Chu, K. Wada, S. Inoue, “An Integrated Array of TiO2- SiO2
-TeO2 Nanotubules on Glass:Fabrication and Structural
Characteristies” , Adv. Mater.,23,1752, 2002.
【3】S. Z. Chu, K. Wada, S. Inoue, S. Todoroki,Y. K. Takahashi, K. Hono,
“Fabrication and Characteristics of Ordered Ni Nanostructures on
Glass by Anodization and Direct Current Electrodeposition” Chem.
Mater.,14, 4595,2002.
【4】K. Nielsch, F. Müller, A.-P. Li, U. Gösele, “Uniform Nickel Deposition
into Ordered Alumina Pores by Pulsed Electrodeposition” Adv. Mater.,
12 , 582,2000.
【5】F. Matsumoto, K. Nishio, H. Masuda, Jpn. J. Appl. Phys., Part
2,43,L640,2004.
【6】S. Z. Chu, S. Inoue, K. Wada, D. Li. H. Haneda, J. Mater. Chem, 13,
866, 2003.
【7】N. I. Tatarenko, A. Mozalev, Solid-State Electron.,45,1009,2001.
【8】A. Mozalev, M. Skairi, I. Saeki, H. Takahashi, “Structure,
Morphology, and Dielectric Propertiesof Nanocomposite Oxide Films
Formed by Anodizingof Sputter-Deposited Ta-Al
Bilayers”Electrochim. Acta, 48,3155,2003.
【9】P. L.Chen, C. T. Kuo, T. G. Tsai, B. W. Wu, C. C. Hsu, F. M.Pan,
“Self-organized titanium oxide nanodot arrays by electrochemical
Anodization”App. Phys. Lett.,82,2796, 2003
【10】Sun-Kyu Hwang, Junghyun Lee, Soo-Hwan Jeong, Pyung-Soo Lee
and Kun-Hong Lee, “Fabrication of carbon nanotube emitters in an
anodic aluminium oxide nanotemplate on a Si wafer by multi-step
anodization” Nanotechnology, Vol. 16 Issue 6, p850-858, 2005
【11】S.Z. Chu, K. Wada, S. Inoue, S. Todoroki., “Fabrication of oxide
nanostructures on glass by aluminum anodization and sol–gel
process”, Surface and Coatings Technology,167, 190,2003.
【12】Konstantin B. Shelimov, Dmitri N. Davydov, and Martin Moskovits
“Template-grown high-density nanocapacitor arrays”Appl. Phys.
Lett.,Vol. 77, No. 11, 2000.
【13】A. P. Li, F. Muller, A. Birner, K. Nielsch, and U. Gosele, Haxagonal
pore arrays with a50-420 nm interpore distance formed by
self-organization in anodic alumina,”J Appl. Phys,84,6023 ,1998.
【14】F. Li, L. Zhang, and R. M. Metzger, “On the Growth of Highly
Ordered Pores in AnodizedAluminum Oxide”Chem. Matter. 10,
2470,1998
【15】G. E. Thompson, “Porous anodic alumina: fabrication,
characterization and application”,Thin Solid Films
297 ,192-201,1997
【16】O. Jessensky, F. Mü ller, U. Gösele, “Self-organized formation of
hexagonal pore arrays in anodic alumina” Appl. Phys. Lett, Vol 72,
No 10,1998
【17】謝詠芬、何快容,中國材料科學學會網路輔助教學課程
http://140.114.18.41/micro/chap11/ch11-2-2.html
【18】Colby A. FOSS, Gabor L, Hornyak, Jon A. Stockert, and Charles R.
Martin', J. Pkys. Ckem.,98, 2963-2971,1994
【19】李正中, 2004, “薄膜光學與鍍膜技術”,藝軒圖書出版社 ,第四版,
Chap 10,283~284
【20】M. Nishizawa, V. P. Menon and C. R. Martin , “Metal Nanotubule
Mebranes with Electrochemically Switchable lon-Transport
Selectivity” science,268,700,1995
【21】R. V. Parthasarathy and C. R. Martin,Adv. Mater.,7,896,1995
【22】B. B. Lakshmi, P. K. Dorhout, and C. R. Martin, “Sol-Gel Template
Synthesis of SemiconductorNanostructures” Chem. Mater., 9,
857-862, 1997
【23】G. S. Cheng, L. D. Zhang, Y. Zhu, G. T. Fei, and L. Li, “Large-scale
synthesis of single crystalline gallium nitride nanowires”, Appl. Phys.
Lett, Vol 75, No 16,1999
【24】Jung Sang Suh and Jin Seung Lee, “Highly ordered two-dimensional
carbon nanotube arrays”, Appl. Phys. Lett, Vol 75, No 14,1999
【25】Po-Lin Chen, Jun-Kai Chang, Cheng-Tzu Kuo, and Fu-Ming Pan,
“Field emission of carbon nanotubes on anodic aluminum oxide
template with controlled tube density” Appl. Phys. Lett, 86,
123111 ,2005
【26】Hideki Masuda, Haruki Yamada, Masahiro Satoh, and Hidetaka Asoh
, “Highly ordered nanochannel-array architecture in anodic” alumina,
Appl. Phys. Lett. 71, 2770 ,1997
【27】Alongkarn Chutinan, Makoto Okano, and Susumu Nodab, “Wider
bandwidth with high transmission through waveguide bends
in two-dimensional photonic crystal slabs”, Appl. Phys. Lett, Vol 80,
No 10,1698-1700,2002
【28】Takayuki Kawashima, Kenta Miura, Takashi Sato, and Shojiro
Kawakami, “Self-healing effects in the fabrication process of
photonic crystals”, Appl. Phys. Lett, Vol. 77, No. 16, 2613 ,2000
【29】S. Kawakami, “Fabrication of submicrometre 3D periodic
structures composed of Si/Si02” ,ELECTRONICS LETTERS, Vol. 33
No. 74 ,1260-1261,1997
【30】J. Yan,G.V.R. Rao,M.Barela,D.A.Brevnov, “Growth Of patterned
Nano pore Arrays Of Anodie Aluminum Oxide”,Adv. Mater.15,No
23,2003
【31】Futoshi Matsumoto, Masahiro Harada, Nobuyuki Koura,
Kazuyuki Nishio, and Hideki Masudaa, “Fabrication and
Electrochemical Behavior of Nanodisk Electrode Arrays with
Controlled Interval Using Ideally Ordered Porous Alumina”
Electrochemical and Solid-State Letters, 7 (11) E51-E53,2004
【32】C. Y. Liu, A. Datta, and Y. L. Wanga “Ordered anodic alumina
nanochannels on focused-ion-beam-prepatterned aluminum
surfaces”, Appl. Phys. Lett., Vol. 78, 120,2001
【33】N. W. Liu, A. Datta, C. Y. Liu, and Y. L. Wang “High-speed
focused-ion-beam patterning for guiding the growth of anodic
alumina nanochannel arrays”, Appl. Phys. Lett., Vol. 82,1281 ,2003
【34】盧俊傑“鈧含量與熱處理對Al-Sc薄膜微結構與表面型態之影響”
國立中央大學,機械工程研究所碩士論文,2004
【35】梁中瑜“液晶顯示器之薄膜電晶體鋁閘極”之研究國立中央大學,光電科學研究所碩士論文,1999
【36】Y.C. Sui, B.Z. Cui, L. Mart’ınez, R. Perez, D.J. Sellmyer, "Pore
structure, barrier layer topography and matrix alumina structure of porous anodic alumina film ", Thin Solid Films, 406, 64-69, 2002
【37】Application Report NanoWizard, Hennesthal@jpk.com
【38】鄭才裕,自我組織奈米級氧化鋁模板陽極氧化機制之研究,暨南國際大學電機工程學所碩士論文,2003指導教授 李正中(Cheng-Chung Lee) 審核日期 2006-7-21 推文 plurk
funp
live
udn
HD
myshare
netvibes
friend
youpush
delicious
baidu
網路書籤 Google bookmarks
del.icio.us
hemidemi
facebook
twitter
google
reddit