使用反應濺鍍法於塑膠基板上製鍍抗反射膜之研究

以作者查詢圖書館館藏

、以作者查詢臺灣博碩士

、以作者查詢全國書目

、勘誤回報

、線上人數：30

、訪客IP：18.227.79.126

姓名

林志雄(Chih-hsiung Lin) 查詢紙本館藏

畢業系所

光電科學研究所碩士在職專班

論文名稱

使用反應濺鍍法於塑膠基板上製鍍抗反射膜之研究
(The Study of Antireflection Coating on Plastic Substrates by Reactive Sputtering)

相關論文

★ 半導體雷射控制頻率	★ 比較全反射受挫法與反射式干涉光譜法在生物感測上之應用
★ 193nm深紫外光學薄膜之研究	★ 超晶格結構之硬膜研究
★ 交錯傾斜微結構薄膜在深紫外光區之研究	★ 膜堆光學導納量測儀
★ 紅外光學薄膜之研究	★ 成對表面電漿波生物感知器應用在去氧核糖核酸及微型核糖核酸雜交反應檢測
★ 成對表面電漿波生物感測器之研究及其在生醫上的應用	★ 探討硫化鎘緩衝層之離子擴散處理對CIGS薄膜元件效率影響
★ 以反應性射頻磁控濺鍍搭配HMDSO電漿聚合鍍製氧化矽摻碳薄膜阻障層之研究	★ 掃描式白光干涉儀應用在量測薄膜之光學常數
★ 量子點窄帶濾光片	★ 以量測反射係術探測光學薄膜之特性
★ 嵌入式繼光鏡顯微超頻譜影像系統應用在口腔癌切片及活體之設計及研究	★ 軟性電子阻水氣膜之有機層組成研究

檔案

[Endnote RIS 格式]

[Bibtex 格式]

[相關文章]

[文章引用]

[完整記錄]

[館藏目錄]

[檢視]

[下載]

本電子論文使用權限為同意立即開放。
已達開放權限電子全文僅授權使用者為學術研究之目的，進行個人非營利性質之檢索、閱讀、列印。
請遵守中華民國著作權法之相關規定，切勿任意重製、散佈、改作、轉貼、播送，以免觸法。

摘要(中)

本文使用電漿監控系統及雙靶極(Dual Cathode)技術，進行穩定的氧化物薄膜濺鍍製程，並將此製程使用於Roll to Roll 塑膠膜濺鍍設備上，控制精確的氧氣含量可得到穩定且高品質的氧化物薄膜。由控制靶極功率、氧氣流量及捲動速度可連續製鍍出多層膜光學膜。
實驗結果顯示，使用雙靶極(Dual Cathode)技術製鍍出的SiO2它的折射率(n)在波長550nm時為1.475081而消光係數(k)為0，為相當好的濺鍍膜質，使用此系統可使濺鍍製程中保持較高的鍍率而靶材表面不至於被毒化。製鍍出的ITO導電光學膜其折射率(n)在波長550nm時為1.992696，消光係數(k)為0.018572。
本實驗使用SiO2及ITO材料交互堆疊濺鍍出多種光學膜，ITO/SiO2/ITO/PET的設計可得到反射率小於2%，穿透率大於92%，面阻抗值為500Ω/□　之具抗反射功能的ITO導電膜。若加入薄金屬層Ag材料的設計，使用ITO/Ag/ITO/SiO2/PET的設計可得到反射率小於2%，穿透率可達85%，面阻抗3.2Ω/□　之超低面阻值、高穿透率的ITO導電膜。使用SiO2/ITO/SiO2/ITO/PET的四層抗反射膜設計，可得到反射率小於0.6%，穿透率大於93%，面電值阻抗為3 X 107(Ω/□)之具有抗靜電功能的抗反射膜。而濺鍍抗反射膜於HC/TAC的塑膠材料上，使用SiO2/ITO/SiO2/ITO/HC/TAC四層抗反射膜設計，可得到反射率0.4%，穿透率大於94%，面電值阻抗為3 X 107(Ω/□)之具有抗靜電功能的抗反射膜。

摘要(英)

The thesis uses plasma emission monitor system and dual cathode technology to conduct the process of oxide thin film sputtering process, and uses this process in the Roll to Roll plastic film sputter equipment, to control the exact amount of oxygen, and to get steady and high-quality oxide thin film. Through the control of the cathode power, oxygen flow, and roller run speed, continuous process of sputtering multi-layer optics film can be done.
The result shows that the SiO2 of refractive index—when sputtering by the dual cathode technology—is 1.475081 in the wavelength of 550nm. It has an excellent quality to the sputtering process. During the sputtering process, the system can maintain the highest sputtering rate and prevent the target from being poisoned. The product of sputtering, ITO electricity-conducting optics film, has a refractive index of 1.992696 in the wavelength of 550nm and extinction coefficient is 0.018572.
The experiment uses SiO2 and ITO to stack and sputter various kinds of optics films. The design of ITO/SiO2/ITO/PET can get an antireflection of ITO electricity-conducting film whose reflectance is less than 2%, transmittance is more than 92%, and sheet resistance is 500Ω/□. Combined with the material -thin metal Ag, the ITO/Ag/ITO/SiO2/PET design can get an ITO electricity- conducting film with a reflectance less than 2%, transmittance more than 85%, and sheet resistance is 3.2Ω/□. The four layer anti-reflection film SiO2/ITO/SiO2/ITO/PET design can get an antireflection and antistatic functions, and its reflectance is less than 0.6%, transmittance more than 93%, and sheet resistance is 3 X 107(Ω/□).
Sputtering antireflection film uses the plastic material HC/TAC. The four layer antireflection film SiO2/ITO/SiO2/ITO/HC/TAC design can get an antireflection and antistatic film with reflectance of 0.4%, transmittance of more than 94%, and sheet resistance is 3 X 107(Ω/□).

關鍵字(中)

★ 反應濺鍍法
★ 抗反射膜

關鍵字(英)

★ anti-reflection film
★ reactive sputter method
★ dual cathode

論文目次

摘要……………………………………………………………………Ⅰ
Abstract………………………………………………………………Ⅱ
誌謝……………………………………………………………………Ⅳ
目錄……………………………………………………………………Ⅴ
圖目錄…………………………………………………………………Ⅷ
第一章緒論 ………………………………………………………… 1
1-1前言 …………………………………………………………… 1
1-2 研究動機及目的 ………………………………………………1
第二章基本原理 ……………………………………………………3
2-1 光學薄膜理論 …………………………………………………3
2-1-1 單層膜-1/4λ0膜層 ………………………………………3
2-1-2 雙層膜 ……………………………………………………4
2-1-3 三層膜及多層膜設計 ……………………………………6
2-2 濺鍍理論 ………………………………………………………7
2-3 基材表面處理及改質…………………………………………13
2-4文獻分析 ………………………………………………………13
第三章實驗步驟……………………………………………………19
3-1 實驗設備………………………………………………………19
3-2 量測裝置………………………………………………………20
3-2-1 光學量測儀器……………………………………………20
3-2-2 電性量測儀器……………………………………………21
3-2-3 物性量測儀器……………………………………………21
3-3 基材選擇………………………………………………………21
3-4 實驗流程與分析………………………………………………22
3-4-1 實驗流程…………………………………………………22
3-4-2 塑膠film的折射率求法…………………………………23
第四章實驗結果與分析……………………………………………26
4-1 遲滯曲線製作…………………………………………………26
4-2 單層光學膜製鍍 ……………………………………………28
4-2-1 SiO2光學膜 ……………………………………………28
4-2-2 ITO光學膜………………………………………………29
4-3 抗反射光學膜製鍍 …………………………………………30
4-3-1 具抗反射供能的ITO導電光學膜 ………………………30
4-3-2 具抗反射功能之ITO導電光學膜模擬 …………………31
4-3-3 具抗反射功能之ITO導電光學膜製作 …………………32
4-4 超低面阻值的ITO導電光學膜……….………………………33
4-4-1 超低面阻值之ITO導電光學膜模擬 ……………………33
4-4-2 超低面阻值之ITO導電光學膜製作 ……………………35
4-5 四層抗反射光學膜……………………………………………37
4-5-1 四層抗反射膜於PET基材上之光學膜模擬 ……………37
4-5-2 四層抗反射光學膜製作於PET基材 ……………………38
4-5-3 四層抗反射膜於HC/TAC基材上之光學膜模擬…………39
4-5-4 四層抗反射光學膜製作於HC/TAC基材…………………40
4-5-5 實驗誤差討論……………………………………………41
4-5-5-1 AR/PET實驗誤差……………………………………41
4-5-5-2 AR/HC/TAC實驗誤差 ………………………………42
第五章結論…………………………………………………………44
參考文獻………………………………………………………………46

參考文獻

1. 李正中，薄膜光學與鍍膜技術，二版，藝軒出版社，台北市，2001年。
2. H.A. Macleod, Thin Film Optical Filters, 2nd ed., McGraw Hill, New York, 1986.
3. 魏炯權，電子材料工程，一版，全華科技出版社，台北市，6-27~6-31頁，2001年。
4. J.E. Mahan, Physical Vapor Deposition of Thin Films, Wiley Interscience, New York, 1986.
5. H. J. Gl?ser, Large Area Glass Coating, Von Ardenne, Dresden, 2000.
6. C. May, F. Milde, and G. Teschner, ”Process Development for Large Area Reactive Magnetron Sputtering”, 45th Annual Technical Conference Proceedings, SVC,153, 2002.
7. R.J. Hill, F. Jansen, ”The use of AC power on cylindrical magnetrons”, J. Non-cryst Solids, Vol.35, 218,1997.
8. R. Hill, S. Nadel, and P. Petrach, ”Large Area Deposition by Mid-Frequency AC Sputtering”, 41st Annual Technical Conference Proceedings, SVC,197, 1998.
9. H. Patel, ”DC Magnetron Sputter Deposition of ITO on Polymeric Webs Using Plasma Emission for Process Monitoring and Control”, 40th Annual Technical Conference Proceedings, SVC, 333, 1997.
10. W.Decker, A. Yializis, ”Surface Functionalization of Polymer Films and Webs Using Subatmospheric Plasmas”, 41st Annual Technical Conference Proceedings, SVC, 355, 1998.
11. J.R. Hall, et al., ”Activated Gas Plasma Surface Treatment of Polymers for Adhesive Bonding”, J. of Applied Polymer Science, Vol 13, pp2085-2096, 1969.
12. C.M. Chen, Polymer Surface Modification and Characterization, Hanser Pub, Cincinnati, 1993.
13. H.K. Pulker, Coatings on Glass, 2nd ed., Elsevier Science, Amsterdam, 1999.
14. J.T. Cox, G. Hass and A. Thelen, J. Opt. Soc. Am., Vol.52, pp.965, 1962.
15. Lockhart, King ”Three layered reflection reducing coatings” J. Opt. Soc. Am., Vol.37. pp. 689-694, 1947
16. U.S. Patent 2478385, R. A. Ragiser, “Multilayer low light reflecting film”, 1949.
17. U.S. Patent 3185020, A. J. Thelen, “Three layer anti-reflection coating”, 1965.
18. U.S. Patent 3235397, H. Millendorfer, “Reflection reducing arrangements”, 1966.
19. U.S. Patent 3432225, F. C. Rock, “Antireflection coating and assembly having synthesized layer of index of refraction”, 1969.
20. U.S. Patent 5170291, Leybold, “Coating, composed of an optically effective layer system, for substrates, whereby the layer system has a high anti-reflective effect, and method for manufacturing the coating”, 1992.
21. U.S. Patent 5579162, Viratec Thin Films, “Antireflection coating for a temperature sensitive substrate”, 1996.
22. U.S. Patent 6284382B1, Sony, “Antireflection film and manufacturing method thereof ”, 2001.
23. U.S. Patent 5783049, Southwall, “Method of making antireflective coatings”, 1998.
24. U.S. Patent 6266193, CPFilms, “Anti-reflective composite”, 2001
25. U.S. Patent 6379788, 3M , “Antireflection Film” , 2002.
26. U.S. Patent 6464822, 3M, “Antireflection Film”, 2002.
27. U.S. Patent 6207263, DNP, “Anti-reflection film and process for preparation thereof ” , 2001.
28. U.S. Patent 6337771, Applied Vacuum Coating, “Anti-reflection high conductivity multi-layer coating on CRT surface made by vacuum sputtering and wet coating”, 2002.
29. U.S. Patent 6441964, Applied Vacuum Coating, “Anti-reflection high conductivity multi-layer coating for flat CRT products”, 2002.
30. 凌國基、鄭秉忠和張治平，「干涉式透明導電膜之研究」，真空科技，第十二卷一期，42~44頁，1999。

指導教授

李正中(C. C. Lee)

審核日期

2007-12-20

推文