參考文獻 |
參考文獻
. T.C. Wen, S.J. Chang, L.W. Wu, Y.K. Su, W.C. Lai, C.H. Kuo, IEEE Trans Electron Dev. 49,1093 (2002).
. L.W. Wu, S.J. Chang, T.C. Wen, Y.K. Su, W.C. Lai, C.H. Kuo, IEEE J Quantum Electron. 38,446 (2002).
. C.H. Kuo, S.J. Chang, Y.K. Su, J.F. Chen, L.W. Wu, J.K. Sheu, IEEE Electron Dev Lett. 23,240 (2002).
. C.H. Kuo, Y.K. Su, S.J. Chang, T. M. Kuan, C.I. Chiang, W.H. Lan,
Jpn J Appl Phys. 41,2489 (2002).
. J. Shewchun, J. Dubow, C. W. Wilmsen, R. Singh, D. Burk, and J. F.
Wager, J. Appl. Phys. 50, 2832 (1979).
. S. Nakamura, T. Mukai, M. Senoh, Appl. Phys. Lett. 64,1687 (1994).
. C.H. Kuo, S.J. Chang, Y.K. Su, J.F. Chen, L.W. Wu, J.K. Sheu, C.H. Chen, G.C. Chi, IEEE Electron. Dev. Lett. 23,240 (2003).
. C.H. Kuo, S.J. Chang, Y.K. Su, L.W. Wu, J.K. Sheu, C.H. Chen, G.C. Chi, Jpn. J. Appl. Phys. Lett. 41,112 (2002).
. C.H. Chen, S.J. Chang, Y.K. Su, J.K. Sheu, J.F. Chen, C.H. Kuo, Y.C. Lin, IEEE Photo. Technol. Lett. 14,908 (2002).
. T.C. Wen, S.J. Chang, L.W. Wu, Y.K. Su, W.C. Lai, C.H. Kuo, C.H. Chen, J.K. Sheu, J.F. Chen, IEEE Trans. Electron. Dev. 49,1093 (2002).
. D.K. Schroder , “Semiconductor Material and Device Characterization” , 2nd edition , p.133.
. D.A. Neamen , “Fundamentals of Semiconductor Physics and Devices”, 3th Edition (半導體物理與元件,譯者:楊賜麟),美商麥格羅‧希爾國際股份有限公司,P.362).
. H. Morkoc, Nitride Semiconductors and Devices, Springer, pp.196 (1999).
. A. Motayed, R. Bathe, M.C. Wood, O.S. Diouf, R.D. Vispute, and S.N. Mohammad ,J. Appl. Phys. 93, 1087 (2002).
. W. Gotz, N.M. Johnson, J. Walker, D.P. Bour, Appl. Phys. Lett. 68, 667 (1996).
. 施敏,半導體元件物理與製作技術,P.353.
. G.K. Reeves, H.B. Harrison, IEEE Electron Dev. Lett. 3, 111 (1982).
. E.H. Rhoderick and R.H. Williams, Metal-Semiconductor Contacts,
Oxford Science Publication.
. X. Guo , E.F. Schubert ,J. Appl. Phys. 90, 4191 (2001).
. H. Kim, J.M. Lee, C. Huh, S.W. Kim, D.J. Kim, S.J. Park, and H. Hwang, Appl. Phys. Lett. 77, 1903 (2000).
. J.S. Jang, S.J. Park, and T.Y. Seong ,Appl. Phys. Lett. 76, 2898 (2000).
. J. Rennie; M. Onomura; S.Y. Nunoue; G. I. Hatakoshi; H. Sugawara; M. Ishikawa , J. Crystal Growth , 189,711 (1998).
. H. Ishikawa, S. Kobayashi, Y. Koide, S. Yamasaki, S. Nagai, J. Umezaki, M. Koike, and M. Murakami, J. Appl. Phys. 81, 1315 (1997).
. J.S. Foresi and T.D. Moustakas ,Appl. Phys. Lett. 62, 2859 (1993).
. J.K. Ho, C.S. Jong, C.C. Chiu, C.N. Huang, K.K. Shih, L.C. Chen, F.R. Chen, and J.J. Kai,J. Appl. Phys. 86, 4491 (1999).
. C.H. Kuo ,S.J. Chang , Jpn J Appl Phys Lett. 41,112 (2002).
. S.J. Chang, Y.K. Su, T. L. Tsai, C.Y. Chang, C.L. Chiang, C.S. Chang, T.P. Chen, and K.H. Huang ,Appl. Phys. Lett. 78, 312 (2001).
. J.K. Sheu , J.M. Tsai , S.C. Shei , W.C. Lai , T.C. Wen , C.H. Kou , IEEE Electron Dev Lett. 22,460 (2001).
. C.H. Kuo , S.J. Chang , Y.K. Su , L.W. Wu , J.K. Sheu , C.H. Chen , Jpn J Appl Phys Lett. 41,112 (2002).
. S.J. Chang , Y.K. Su , T.L. Tsai , C.Y. Chang , C.L. Chiang , C.S. Chang , Appl Phys Lett. 78,312 (2001).
. W.C. Lai , M. Yokoyama , S.J. Chang , J.D. Guo , C.H. Sheu , T.Y. Chen, Jpn J Appl. Phys Lett. 39,1138 (2000).
. G.K. Reeves and H.B. Harrison, IEEE Electron Device Lett.
EDL. 3, 111 (1982).
. 唐邦泰,”透明導電膜與氮化鎵接觸特性研究”,中央大學光電所,
碩士論文(2001).
. C.Y. Hsu, W. H. Lan, and Y. S. Wu , Appl. Phys. Lett. 83, 2447 (2003).
. C.S. Lee, Y.J. Lin, and C. T. Lee , Appl. Phys. Lett. 79, 3815 (2001).
. L.C. Chen, J.K. Ho, C.S. Jong, C.C. Chiu, K.K Shih, F.R. Chen, J.J. Kai, and L. Chang, Appl. Phys. Lett. 76, 3703 (2000).
. T. Margalith, O. Buchinsky, D.A. Cohen, A.C. Abare, M. Hansen, S. P. DenBaars , and L.A. Coldren, Appl. Phys. Lett. 74, 3930 (1999).
. K. Kumakura, T. Makimoto, and N. Kobayashi, Appl. Phys. Lett. 79, 2588 (2001).
. J.K. Kim, J.L. Lee, J.W. Lee, H.E. Shin, Y.J. Park, and T. Kim, Appl. Phys. Lett. 73, 2953 (1998).
. C.C. Pan, C.M. Lee, J.W. Liu, G.T. Chen, and J.I. Chyi , Appl. Phys. Lett. 84, 5249 (2004).
. T. Wang, Y.H. Liu, Y.B. Lee, J.P. Ao, J. Bai, and S. Sakai ,Appl.
Phys.Lett. 81, 2508 (2002).
. T. Nishida, H. Saito, and N. Kobayashi Appl. Phys. Lett. 79, 711 (2001).
. J.S. Jang, S.J. Park, and T.Y. Seonga , Appl. Phys.
Lett. 76, 2898 (2000).
. H. Kim, J.M. Lee, C. Huh, S.W. Kim, D.J. Kim, S.J. Park, and H. Hwang, Appl. Phys. Lett. 77, 1903 (2000).
. R. Zheng and T. Taguchi , SPIE Proc.4996,105 (2003).
. J.Y. Kim, S.I. Na, G.Y. Ha, M.K. Kwon, I.K. Park, J.H. Lim, S.J. Park, M. H. Kim, D.Choi, and K. Min , Appl. Phys. Lett. 88, 43507 (2006).
. R.H. Horng, C.C. Yang, J.Y. Wu, S.H. Huang, C.E. Lee, and D.S. Wuu,Appl. Phys. Lett. 86, 221101 (2005).
. J.S. Cabalu, C. Thomidis, T.D. Moustakas, S. Riyopoulos, L. Zhou, and D. J. Smith ,J. Appl. Phys. 99, 64904 (2006).
. C.H. Kuo, S.J. Chang, Y.K. Su, R.W. Chuang, ; C.S. Chang,; L.W. Wu, W.C. Lai, J.F. Chen, J.K. Sheu, Materials Sciences and Engineering .106,69 (2004). |