姓名 |
邱千峰(Chien-Feng Chiu)
查詢紙本館藏 |
畢業系所 |
物理學系 |
論文名稱 |
穿透式薄膜光柵之製作與分析 (The Fabrication and Analysis of SiNx Membrane Grating on Si Substrate)
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相關論文 | |
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摘要(中) |
近年來微機電和微光機電的系統的發展,帶領著我們走向微小化和積體化的元件,如何將微機電和微光機電的系統應用到實際的生活領域中,都是每位研究者所努力的目標。
本論文是以繞射理論為基礎,加上利用半導體製程技術與微機電系統之技術以製作薄膜光柵。首先在矽晶片上沉積低應力與高透光率之氮化矽,接著在氮化矽上製作二階式光柵後,把矽晶片浸泡於溫度80度、濃度為45%的氫氧化鉀溶液內去製作薄膜光柵,並利用光學顯微鏡、表面輪廓儀及原子力顯微鏡去取檢驗其製作品質,架設光學量測儀器量測此薄膜光柵之光學繞射情形。
本文於第一章大略敘述研究之動機,於第二章敘述光柵的基本原理與類型,實驗所使用到的技術會有電漿輔助化學氣相沉積法、低壓力氣相沉積法、微影製程、感應耦合電漿蝕刻及濕蝕刻,分別會在第三章與第四章敘述,將薄膜光柵之實驗結果列於第五章,並於第六章給予探討與未來展望。 |
摘要(英) |
Recently,much attention has been paid to miniaturizing an optical device. In this study,a diffraction grating is fabricated by the microoptoelectromechanical (MOEMS) technology. The miniaturization and integration of electronics have created a far-reaching technological revolution.
In this paper, we fabricated transmission gratings and studied the diffraction effect of the grating periods. Transmission gratings were designed and fabricated by photolithography and anisotropic wet etching in a SiNX membrane upon a silicon substrate. The fabrication process is as follow. We deposit a low stress and high transmittance SiNX layer on both sides of a Si substrate using plasma-ehanced chemical-vapor deposition or low Pressure Chemical Vapor Deposition. Subsequent optical lithography is used to define grating structures which is transferred into the SiNX layer. Applying wet etching, anisotropic wet etching in a KOH solution results in a Si frame, where the upper SiNX layer serves as an etch stop. Then we build SiNX membranes gratings with dimensions of a few thousands of micrometer side length.The properties of SiNx membrane gratings were analyzed by the measurements of optical microscopy, surface profiler, AFM and optic equipment. |
關鍵字(中) |
★ 鼓膜 ★ 光柵 ★ 氫氧化鉀 ★ 氮化矽 ★ 感應耦合電漿離子蝕刻 ★ 低壓化學氣相沉積 ★ 電漿輔助化學氣相沉積 |
關鍵字(英) |
★ PECVD ★ LPCVD ★ ICP ★ Silicon Nitride ★ membrane ★ grating ★ KOH |
論文目次 |
論文摘要.........................Ⅱ
目錄...........................Ⅲ
圖目錄..........................Ⅴ
表目錄..........................Ⅸ
第一章 緒論.......................1
第二章 繞射光柵理論及效率參數..............4
2.1 光柵基本結構與作用................4
2.2 基本光柵強度分佈與相關效率參數..........4
2.2.1 單狹縫繞射..................5
2.2.2 光柵繞射...................6
2.2.3 主極大和光柵方程式.............10
2.3 光柵的種類與特性................11
2.3.1 光柵的分類.................11
2.3.2 二相式光柵.................13
2.4 繞射角度.....................16
第三章 薄膜光柵之製程設備...............18
3.1 氮化矽薄膜之沉積製程.............18
3.1.1 電漿輔助化學氣相沉積法..........18
3.1.2 低應力化學氣相沉積法...........22
3.2 感應耦合電漿蝕刻機..............23
第四章 薄膜光柵之製作.................26
4.1 薄膜沉積....................26
4.2 微影製程....................27
4.3 蝕刻......................29
4.3.1 乾蝕刻法..................29
4.3.2 溼蝕刻法..................30
4.3.3 矽晶片的非等向性蝕刻............30
4.4 製作流程....................32
第五章 薄膜光柵特性之量測...............36
5.1 表面輪廓之量測.................36
5.1.1 光學顯微鏡.................36
5.1.2 表面輪廓測厚儀...............41
5.1.3 原子力顯微鏡................42
5.2 光學特性之量測.................45
5.2.1 微光學測量儀器之架設............45
5.2.2 薄膜光柵之分光效果.............45
5.2.3 薄膜光柵之繞射效率.............48
5.2.4 兩個光柵堆疊的結果.............59
第六章 總結與未來展望................60
6.1 薄膜光柵與傳統光柵之比較............60
6.2 未來展望....................61
參考文獻........................64 |
參考文獻 |
[1]牟緒程,鄭新元,董文達,”波動與光學-下冊”,清華大學出版社,1994.
[2]W. H. A. Finchan , M. H. Freeman著,楊建人譯,”光學原理”,徐氏基金會,1986.
[3]Marc Madou, “Fundamentals of Microfabrication”, CRC Press, “Wet Bulk Micromachining”, P.145~P.215, 1997.
[4]Joseph W. Goodman, “Introdution to Fourier Optics”, McGRAW-HILL, P.63~P.87, 1996.
[5]B. Kress and P. Meyrueis, “Digital Diffractive Optics An Introduction to Planar Diffractive Optics and Related Technology”,John Wiley & SONS, LTD,P.1~P.16, 2000.
[6]Steven L. and Thomas J., “A Comparison of Cleaning procedures for Removing Potassium Wafers Exposed to KOH”, IEEE TRANSACTIONS ON ELECTRON DEVICES, VOL. 40, NO. 2, 1993.
[7]Kenji Tokoro, Daisuke Uchikawa, Mitsuhiro Shikida, and Kazuo Sato, “Anisotropic Etching properties of Silicon in KOH and TMAH Solutions”, IEEE Micromechatronics AND HUMAN SCIENCE, 1998.
[8]Hong Xiao著,羅正忠、張鼎張譯,”半導體製程技術導論”,台北培生教育出版股份有限公司,2002. |
指導教授 |
紀國鐘(Guo-Chung Chi)
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審核日期 |
2004-7-18 |
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