光致變色式全像干涉術形變量測系統

以作者查詢圖書館館藏

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姓名

楊洋(Yang Yang) 查詢紙本館藏

畢業系所

光機電工程研究所

論文名稱

光致變色式全像干涉術形變量測系統
(Deformation Measurement System by Photochromic-Material-Based Holographic Interferometry)

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摘要(中)

本論文提出一套操作步驟較為簡潔的新式全像形變量測技術：「光致變色式全像干涉術形變量測系統」。研究中我們以全像拍攝的方式量測高反射率鏡面物體與低反射率粗糙物體的形變，將變化前後之波前資訊以紫光雷射(405 nm)記錄於光致變色材料上。其中高反射率鏡面物體形變量測實驗的條紋靈敏度為362.3 nm/條，而低反射率粗糙物體形變量測實驗的條紋靈敏度為1.029 μm/條。有別於傳統的部分是其不需要將記錄媒體取下進行顯影、定影、清洗、風乾等繁瑣步驟，曝光後即可直接重建出物體影像，此外遮蔽光源後即可洗去全像光柵，每次量測完成，不需要更換記錄媒體，可以重複使用。

摘要(英)

We proposed a simpler and newer deformation measurement system by photochromic material-based holographic interferometry. In this research, we measured deformation from high reflectivity object and low reflectivity object, the wave information recorded on photochromic material by purple laser (405 nm). The sensitivity is 362.3 nm in the high reflectivity object deformation measurement experiment, and the sensitivity is 1.029 μm in the low reflectivity object deformation measurement experiment. Different from tradition, the process is no need to remove the photochromic material to development, fixing, cleaning, air drying and any other steps, it can directly reconstruct the object image after exposure. In addition, the holographic grating can be erased after shielding the light source. Every time we completed the measurement, there is no need to change the recording media. It can be reused.

關鍵字(中)

★ 全像術
★ 量測
★ 光致變色
★ 面外位移

關鍵字(英)

★ Hologram
★ Measurement
★ photochromism
★ out-of-plane displacement

論文目次

摘要
ABSTRACT II
致謝 III
目錄 IV
圖目錄 VI
表目錄 IX
第一章緒論 1
1-1 研究背景 1
1-2 文獻回顧 2
1-2-1 光學式形變量測技術回顧 2
1-2-2 光致變色全像技術文獻回顧 8
1-3 研究目的 8
1-4 論文架構 9
第二章基礎理論 10
2-1 全像攝影術 10
2-1-1 全像架構之分類 10
2-1-2 全像記錄體之分類 13
2-1-3 全像記錄體之種類 14
2-1-4 繞射效率 14
2-2 全像攝影術之數學 15
2-2-1 全像干涉條紋之建立 15
2-2-2 物體影像之重建 16
2-3 全像干涉術之概論 17
2-4 全像干涉術之數學 18
2-5 變形量與條紋數之關係 19
2-6 光致變色原理 20
2-6-1 概述 20
2-6-2 光致變色材料之分類 21
2-6-3 光致變色特性 22
第三章系統架構 23
3-1 實驗設備 23
3-2 光致變色片之測試 25
3-2-1 光致變色片吸收波段測試 26
3-2-2 光致變色片變色效能測試 29
3-2-3 光致變色片作為全像記錄媒體之測試 31
3-3 量測架構 33
3-3-1 光致變色式全像變形量測架構 33
3-3-2 系統量測範圍 36
3-3-3 面外位移變形量測驗證架構 37
3-4 前置準備與實驗流程 40
3-5 光致變色全像條紋產生之過程 40
3-6 實驗數據分析流程 42
3-7 小結 43
第四章實驗結果與討論 44
4-1 系統參數設置 44
4-1-1 曝光時間 44
4-1-2 光程差與入射角度調整 49
4-2 高反射率鏡面物體形變實驗 50
4-2-1 條紋靈敏度 50
4-2-2 晶圓面外位移 55
4-3 低反射率粗糙物體形變實驗 58
4-4 小結 62
第五章結論與未來展望 63
5-1 結論 63
5-2 未來展望 64
參考文獻 65

參考文獻

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指導教授

李朱育(Ju-Yi Lee)

審核日期

2017-7-27

推文