高功率脈衝磁控濺鍍技術鍍製高硬度光學多 層膜的研究

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胡智瑋(Chih-Wei Hu) 查詢紙本館藏

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照明與顯示科技研究所

論文名稱

高功率脈衝磁控濺鍍技術鍍製高硬度光學多層膜的研究
(The Research of Transparent Hard Coating Deposited by HIPIMS Deposition Technique)

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摘要(中)

在本研究中，以高功率脈衝電漿源結合封閉非平衡磁控濺鍍系統來製備氮化矽(Silicon Nitride)和氮氧化矽(Silicon Oxynitride)薄膜，研究結果指出，使用矽靶材(純度99.99%)，反應濺鍍氮化矽薄膜在玻璃上，其可見光波長範圍的平均穿透率達83.9%，硬度接近30GPa，遠大於藍寶石的硬度，在通入部分的氧氣後，氮氧化矽的硬度下降到19GPa，但其在可見光範圍的平均穿透率卻上升到88.6%。接著，運用光學薄膜理論，設計並鍍製多層光學硬膜，其結構為光學硬膜/B-270 玻璃/4-layers 抗反射膜，此多層光學硬膜在可見光範圍的平均穿透率可達到96%，硬度為21GPa，等同於藍寶石的硬度，在外層當作保護層的光學硬膜其為非晶態，具有極小的表面粗糙度(0.225 nm)。
至此，成功研究出製鍍高硬度且表面平滑的鍍膜方法，可望當作各類光
學元件的保護層。

摘要(英)

In this research, silicon nitride and silicon oxynitride films have been fabricated by using the high-power impulse magnetron sputtering and closed field unbalanced magnetron sputtering system with Si targets.According to the research results, the average transmittance of the SixNy film on the glass in the visible wavelength range was up to 83.9% and the hardness of the thin films was about 30 GPa, much larger than the hardness of sapphire. After introducing working gas O2, the hardness of silicon oxynitride films decreased to 19 GPa but the average transmittance on the glass increased to 88.6% in the visible wavelength range. Finally, the film structure of transparent hard coating/glass/4-layers AR
coating was designed and deposited. Its average transmittance was 96.0% in the visible wavelength range while the hardness was 21GPa. The transparent
hard coating was amorphous with surface roughness of 0.225 nm. All of the results indicated that we have found a new deposition technique which was suitable for the applications of both optical and protective coatings.

關鍵字(中)

★ 光學薄膜
★ 高功率脈衝系統
★ 封閉非平衡磁控濺鍍

關鍵字(英)

★ Optical thin films
★ High power impulse magnetron sputtering
★ Closed field unbalanced magnetron sputtering system

論文目次

目錄
中文摘要……………………………………………………………… ⅰ
英文摘要……………………………………………………………… ⅱ
致謝…………………………………………………………………… ⅲ
目錄…………………………………………………………………… ⅳ
圖目錄………………………………………………………………… ⅷ
表目錄………………………………………………………………… ⅸ
第一章緒論………………………………………………………… 1
1-1 研究背景及動機…………………………………………… 1
1-2 文獻回顧…………………………………………………… 4
1-3 研究目標…………………………………………………… 7
1-4 本文架構…………………………………………………… 8
第二章相關理論介紹……………………………………………… 10
2-1 沉積物理現象……………………………………………… 10
2-1-1 薄膜沉積理論…………………………………… 10
2-1-2 物理氣相沉積分類……………………………… 13
2-2 光學薄膜理論簡介………………………………………….. 13
2-2-1 抗反射鍍膜理論………………………………... 15
2-3 封閉非平衡磁控濺鍍(CFUBMS)原理介紹………………… 18
vi
2-3-1 濺鍍現象介紹……………………………………. 18
2-3-2 封閉非平衡磁控濺鍍……………………………. 19
2-4 高功率脈衝磁控濺鍍(HIPIMS)原理介紹…………………. 22
2-4-1 HIPIMS 判定基準……………………………….. 23
2-4-2 HIPIMS/UBMS 系統介紹……………………….. 24
第三章薄膜分析方法………………………………………………. 26
3-1 薄膜機械性質量測…………………………………………. 26
3-1-1 奈米壓痕測試原理分析…………………………. 26
3-1-2 薄膜耐磨性測試………………………………. 28
3-2 薄膜結構與光學分析………………………………………. 28
3-2-1 原子力顯微鏡(AFM)介紹及原理分析………….. 30
3-2-2 掃瞄電子顯微鏡(SEM)介紹及原理分析……….. 31
3-2-3 UV-Visible 光譜儀介紹及原理分析…………….. 33
3-3 研究方法及實驗流程……………………………………….. 33
3-3-1 鍍膜材料選擇……………………………………... 33
3-3-2 基板介紹及清潔流程……………………………… 34
3-3-3 氮化矽及氮氧化矽薄膜製備……………………… 36
3-3-4 薄膜特性量測……………………………………… 37
第四章結果與討論………………………………………………….. 38
4-1 氮化矽薄膜製程結果與討論……………………………… 38
4-1-1 脈衝放/儲能時間對氮化矽薄膜製程的影響……… 38
4-1-2 製程溫度對氮化矽薄膜製程的影響………………. 41
4-1-3 脈衝放/儲能時間固定下不同通氮量的影響……… 43
4-1-4 氮化矽薄膜性質討論……………………………… 46
4-2 氮氧化矽薄膜製程結果與討論…………………………… 49
4-2-1 不同通氧量對氮氧化矽薄膜的影響……………… 49
4-2-2 製程溫度對氮氧化矽薄膜製程的影響…………… 51
4-3 光學硬膜製程及結果……………………………………… 53
4-3-1 光學抗反射多層硬膜討論…………………………… 53
4-3-2 光學抗反射多層硬膜結果…………………………… 55
4-4 實際應用…………………………………………………… 58
4-4-1 PET 保護硬膜……………………………………….. 58
4-5 實驗總結……………………………………………………. 60
參考文獻………………………………………………………………... 61

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指導教授

陳昇暉(Sheng-Hui Chen)

審核日期

2018-1-29

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