| 摘要(英) |
This study proposes a novel approach that combines ellipsometry techniques with spectral reflection measurements to analyze the characteristics of optical thin films, including thickness and refractive index. To ensure measurement accuracy, error analysis is conducted through simulations before actual thin film measurements are performed. This practice aids in promptly identifying potential issues during the experimental process and taking corrective measures to enhance overall accuracy.
Following the simulation analysis, further prediction of error thresholds for various parameters is carried out. For instance, within the anticipated range of errors, such as thickness deviations below 2 nanometers and refractive index errors less than 0.5%, the absolute errors of polarizing angles and analyzer angles in actual thin film measurements need to be less than 0.1 degrees, while the absolute error of the incident angle should be less than 0.2 degrees. These error thresholds ensure that the results obtained during the experimental process maintain a certain level of accuracy within acceptable limits.
To achieve optimal fitting effects, this study employs a genetic algorithm to identify the global best solution within the entire parameter space. Additionally, the use of the RAE architecture and a four-point measurement method facilitates rapid system measurement and computation. These choices not only expedite the measurement process but also simplify operations.
Stability tests and standard sample assessments successfully validate the stability and accuracy of the system. With decreasing errors and program optimization, the measured thickness of ultra-thin films using this system exhibits absolute errors consistently below 0.8 nanometers, while the percentage error in refractive index remains below 1%, showcasing system stability and precision once again.
In summary, the method and system presented in this study provide a potent tool for analyzing the characteristics of optical thin films. By combining ellipsometry techniques with spectral reflection measurements and guided by simulation analysis, the research effectively achieves high-precision measurements of sub-nanometer-level thickness. |
| 參考文獻 |
[1] 李文智。「PSA 簡式橢圓儀」。碩士論文，國立交通大學光電工程系研究所，1995。
[2] 林奕德。「數值分析簡式橢偏儀中的偏光片及析光片之校正及更正」。碩士論文，國立交通大學光電工程系研究所，2005。
[3] 李康源。「偏光片-樣品-析光片之影像式橢圓偏光術」。博士論文，國立交通大學光電工程系研究所，2005。
[4] 蕭家鼎。「以模擬退火法推算薄膜之光學常數」。碩士論文，國立中央大學光電工程系研究所，2006。
[5] 李孟錡。「掃描式白光干涉儀應用在量測薄膜之光學常數」。博士論文，國立中央大學光電工程系研究所，2012。
[6] 朱緒丹，張榮君*，鄭玉祥，王松有，陳良堯。「橢圓偏振光譜測量技術及其在薄膜材料研究中的應用」。中國光學，2095-1531(2019)06-1195-40。
[7] 李正中，薄膜光學與鍍膜技術 第七版，藝軒圖書出版社，(2012)。
[8] Tompkins, H. G., & Hilfiker, J. N. (2016). Spectroscopic Ellipsometry: Practical Application to Thin Film Characterization. Momentum Press®, LLC, 49-51.
[9] Fujiwara, H., & Collins, R. W. (2018). Spectroscopic Ellipsometry for Photovoltaics, Volume 1: Fundamental Principles and Solar Cell Characterization. Springer Nature Switzerland AG.
[10] Fujiwara, H. (2007). Spectroscopic Ellipsometry Principles and Applications. Maruzen Co. Ltd, Tokyo, Japan, 81-93.
[11] Chauhan, S. S. (2018). Ellipsometry for measuring the thickness of thin films. School of Physical Sciences NISER, Bhubaneswar, 2-8.
[12] J. A. Wollam Co. (2011). CompleteEASETM Data Analysis Manual.
[13] Jung, J., Bork, J., Holmgaard, T., & Kortbek, N. A. (2004). Ellipsometry. Aalborg University, Institute of Physics and Nanotechnology.
[14] Azzam, R. M. A., & Bashara, N. M. (1977). Ellipsometry and Polarized Light. North-Holland, Amsterdam.
[15] Jellison, G. E. Jr. (2005). Data analysis for spectroscopic ellipsometry. In H. G. Tompkins & E. A. Irene (Eds.), Handbook of Ellipsometry (pp. 237-296). William Andrew.
[16] Collins, R. W. (1990). Automatic rotating element ellipsometers: calibration, operation, and real-time applications. Review of Scientific Instruments, 61, 2029.
[17] Hauge, P. S., & Dill, F. H. (1975). A rotating-compensator Fourier ellipsometer. Optics Communications, 14, 431-437.
[18] Chao, Y. F. (2017). The Development of Three-Intensity Measurement in PSA Ellipsometry and Photoelastic Modulation Ellipsometry. IntechOpen.
[19] Postava, K., Maziewski, A., Yamaguchi, T., Ossikovski, R., Visnovsky, S., & Pistora, J. (2004). Null ellipsometer with phase modulation. Optical Society of America.
[20] Chao, Y. F., Lee, K. Y., & Lin, Y. D. (2016). Analytical solutions of the azimuthal deviation of a polarizer and an analyzer by polarizer–sample–analyzer ellipsometry. Optical Society of America, 120.2130, 120.4290.
[21] Chao, Y. F., Lee, W. C., Hung, C. S., & Lin, J. J. (1998). A three-intensity technique for polarizer–sample-analyser photometric ellipsometry and polarimetry. Journal of Physics D: Applied Physics, 31, 1968.
[22] Garcia-Caurel, E., Ossikovski, R., Foldyna, M., Pierangelo, A., Drévillon, B., & De Martino, A. (2013). Chapter 2: Advanced Mueller Ellipsometry Instrumentation and Data Analysis. In Book Title (pp. 10.1007/978-3-642-33956-1_2). Springer-Verlag Berlin Heidelberg. |
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