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姓名	林浚煒(Jun-Wei Lin)  查詢紙本館藏	畢業系所	化學工程與材料工程學系
論文名稱	製備規則有序矽單晶微奈米孔洞陣列及增強其近紅外光吸收特性之研究
相關論文	★ 規則氧化鋁模板及鎳金屬奈米線陣列製備之研究 ★ 電化學沉積法製備ZnO:Al奈米柱陣列結構及其性質研究 ★ 溼式蝕刻製程製備矽單晶奈米結構陣列及其性質研究 ★ 氣體電漿表面改質及濕式化學蝕刻法結合微奈米球微影術製備位置、尺寸可調控矽晶二維奈米結構陣列之研究 ★ 陽極氧化鋁模板法製備一維金屬與金屬氧化物奈米結構陣列及其性質研究 ★ 水熱法製備ZnO, AZO 奈米線陣列成長動力學以及性質研究 ★ 新穎太陽能電池基板表面粗糙化結構之研究 ★ 規則準直排列純鎳金屬矽化物奈米線、奈米管及異質結構陣列之製備與性質研究 ★ 鈷金屬與鈷金屬氧化物奈米結構製備及其性質研究 ★ 單晶矽碗狀結構及水熱法製備ZnO, AZO奈米線陣列成長動力學及其性質研究 ★ 準直尖針狀矽晶及矽化物奈米線陣列之製備及其性質研究 ★ 奈米尺度鎳金屬點陣與非晶矽基材之界面反應研究 ★ 在透明基材上製備抗反射陽極氧化鋁膜及利用陽極氧化鋁模板法製備雙晶銅奈米線之研究 ★ 準直矽化物奈米管陣列、超薄矽晶圓與矽單晶奈米線陣列轉附製程之研究 ★ 尖針狀矽晶奈米線陣列及凖直鐵矽化物奈米結構之製備與性質研究 ★ 金屬氧化物奈米結構製備及其表面親疏水性質之研究
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摘要(中)	本研究透過奈米球微影術結合濕式化學蝕刻法製備出大面積均一尺寸之奈米倒金字塔陣列取代傳統光阻及光罩以低成本將單晶矽表面圖案化，並以此為基礎成功在N-type(100)矽晶圓上以室溫光輔助電化學蝕刻法製備出大面積規則矽單晶奈米孔洞陣列，利用此方法可以透過形成高深寬比且具有漸變折射率之錐型結構，並探討隨著蝕刻時間增加對光學性質及親疏水性質的變化。 本研究透過兩種方式改善近紅外光波段的吸收率，其一為透過無電鍍沉積法沉積銀奈米顆粒形成矽單晶奈米通道/銀奈米顆粒異質結構，並探討沉積時間對光學之影響。第二種方法為透過金屬濺鍍沉積法均勻濺鍍鎳金屬薄膜於結構表面，並在高溫爐中退火形成矽化鎳奈米孔洞結構，透過近紅外光光譜量測發現和純矽基材料相比在近紅外光波段鎳矽化物奈米孔洞陣列的吸收率提升，並且在可見光波段的吸收度比矽/銀奈米顆粒異質結構較佳，證明金屬矽化物在改善在近紅外光波段矽基奈米材料的可用性。本研究提供一簡易途徑可製備高效且高穩定性之矽化鎳奈米孔洞陣列製備過程，並在各式光學器件都有良好的前景。
摘要(英)	In this study, we combined the polystyrene nanosphere lithography and wet chemical etching to fabricate large-area, uniform-sized inverted pyramid arrays, replacing traditional photoresists and photomasks to pattern silicon surfaces at low cost. After that, we developed a novel and room-temperature approach, a large-area, regular silicon single-crystal nanochannel array was successfully fabricated on N-type (100) silicon wafer This method allows for the formation of high aspect ratio tapered structures with gradient refractive indices. The study investigates the changes in optical properties and hydrophobic/hydrophilic properties with increased etching time. Two strategies be considered to enhance the absorption in the near-infrared wavelength. The first method involves depositing silver nanoparticles by electroless plating to form silicon/silver heterostructure, and the impact of deposition time on optical properties is explored. The second method employs metal sputtering to uniformly deposit a nickel metal film on the surface of the structure, followed by high-temperature annealing in a furnace with pure nitrogen to form a nickel silicide nanochannel structure. Spectral measurements reveal that compared to pure silicon nanostructure, the NiSi nanostructure exhibit enhanced the near-infrared absorption and better absorption in the visible region compared to the silicon channel/silver nanoparticle heterostructure. This study provides a simple approach to fabricate high-efficiency and high-stability nickel silicide nanochannel arrays, showing good prospects for various optical devices.
關鍵字(中)	★ 奈米球微影術 ★ 矽單晶微奈米孔洞陣列 ★ 無電鍍沉積銀奈米顆粒 ★ 鎳矽化物奈米結構	關鍵字(英)
論文目次	目錄 第一章 前言及文獻回顧 1 1-1 前言 1 1-2 一維矽單晶奈米結構 2 1-2-1奈米孔洞結構特性及相關應用 2 1-2-2微奈米孔洞結構製備方式 3 1-3 接觸角理論 4 1-4 近紅外光相關技術之運用 6 1-5 金屬奈米粒子特性之探討 7 1-6 金屬矽化物奈米結構 8 1-6-1 金屬矽化物之製程演進 8 1-6-2一維鎳矽化物奈米結構製備 10 1-7 研究動機及目標 10 第二章 實驗步驟及實驗設備 12 2-1 規則有序且尺寸可調控之矽單晶奈米孔洞陣列結構 12 2-1-1 矽晶基材使用前處理 12 2-1-2 自組裝尺寸可調之奈米球模板製備 12 2-1-3 奈米球微影術結合鹼性溶液蝕刻法製備奈米尖孔結構 13 2-1-4 光輔助電化學蝕刻法製備矽單晶微奈米孔洞陣列 13 2-2 矽微奈米孔洞陣列/銀奈米顆粒異質結構 13 2-3 鎳矽化物微奈米孔洞陣列結構 14 2-3-1 濺鍍沉積鎳金屬薄膜 14 2-3-2高溫熱退火處理形成鎳矽微奈米孔洞結構 14 2-3 試片分析 15 2-3-1 掃描式電子顯微鏡 15 2-3-2 影像式水滴接觸角量測儀 15 2-3-3可見光-近紅外光光譜儀 15 2-3-4 X光繞射儀 16 第三章 結果與討論 17 3-1 單層自主裝奈米球模板陣列及奈米尖孔陣列製備 17 3-2 規則有序排列之矽單晶微奈米孔洞陣列 19 3-2-1微奈米孔洞陣列製備 19 3-2-2微奈米孔洞陣列光學性質量測分析 23 3-2-3微奈米孔洞陣列水滴接觸角量測分析 24 3-3奈米銀顆粒/矽單晶微奈米孔洞異質結構 25 3-3-1 光學性質量測 26 3-4 規則有序排列之鎳矽化物微奈米孔洞陣列 27 3-4-1 金屬矽化物光學性質量測分析 28 第四章 結論與未來展望 29 參考文獻 30 圖目錄 38
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指導教授	鄭紹良(Shao-Liang Cheng)	審核日期	2024-8-22
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