鋁摻雜氧化鋅近紅外窄帶通濾光片之研究

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姓名

張香允(Hsiang-Yun Chang) 查詢紙本館藏

畢業系所

光電科學與工程學系

論文名稱

鋁摻雜氧化鋅近紅外窄帶通濾光片之研究
(Research on the Aluminum-doped-zinc-oxide Near-infrared Narrow-bandpass Filters)

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至系統瀏覽論文 (2027-8-1以後開放)

摘要(中)

近紅外光波段(Near-IR)由於其在大氣中有高穿透性，且部分特定波段在自然環境中太陽輻射背景值極低，與可見光相比可以提供更可靠的測量結果，因此在車載、LiDAR、通訊、生醫等多方面的感測器需求量日漸增加，而在元件微型化的情形下，現有成熟薄膜材料所製作的近紅外光多層膜膜層過厚不易與矽基感測器整合，因此需要開發新的高低折射率材料來完成近紅外光波段的光學應用。而本研究利用鋁摻雜氧化鋅作為低折射率材料，確認該材料特性及實際應用至1310 nm處之窄帶通濾光片。
本實驗使用HiPIMS高功率脈衝磁控濺鍍進行。第一部分為確認鋁摻雜量之影響，透過調變濺鍍靶材上的鋁摻雜濃度、氧氣通量以及快速熱退火溫度，確認AZO的吸收現象，判斷適合應用於1310 nm處的摻雜比例及後續訂製混合靶材的比例。第二部分為調整混合靶材的製程參數，並透過氧氣通量、Duty Cycle、快速熱退火等，優化薄膜結構來獲取最佳光學特性之薄膜。第三部分則為SiH高折射率材料的最優化，透過調變氫氣通量、快速熱退火取得折射率較高、吸收最低且穩定之薄膜。最後第四部分則為設計及鍍製多層膜樣品，結合上述章節的結果，以不同參數AZO薄膜，實際堆疊穿透窗於1310 nm處的窄帶通濾光片樣品，並探討其優劣變化，並同樣進行快速熱退火處理觀察其退火後變化。

摘要(英)

Near-infrared (Near-IR) wavelengths are increasingly in demand for sensors across various domains, such as automotive, LiDAR, communications, and biomedical applications. This is due to their high transparent in the atmosphere and the presence of specific bands with extremely low solar background radiation, which provide reliable measurements that visible light cannot discern. However, with the miniaturization of devices, the existing thin-film materials used for fabricating multilayer near-IR filter become too thick to be integrated with Si-based sensors easily. Therefore, to develop new high and low refractive index materials to fulfill optical applications in the Near-IR wavelength range is necessary. This study has utilized aluminum-doped zinc oxide (AZO) as a low refractive index material, confirming its characteristics and practical application in narrowband pass filters at 1310 nm.
High Power Impulse Magnetron Sputtering (HiPIMS) has been applied in this experiment. The first part of this research focuses on determining the impact of aluminum doping. By adjusting the doping of aluminum on the sputtering target, oxygen flow, and rapid thermal annealing (RTA) temperature, the absorption phenomenon of AZO is confirmed. The appropriate doping ratio for application at 1310 nm is determined, followed by customizing the proportion of the mixed target. The second part involves optimizing the process parameters of the mixed target. By adjusting the oxygen flow, duty cycle, and RTA, the film structure is optimized to achieve the most suitable optical properties. The third part involves optimizing the high refractive index SiH. By adjusting the hydrogen flow and RTA, a film with higher refractive index, lower absorption, and greater stability is obtained. The final part involves designing and depositing multilayer film samples. Combining the results from the previous sections, different parameter AZO films are stacked to produce narrowband pass filter samples at 1310 nm. The performance variations are explored, and the effects of RTA are observed.

關鍵字(中)

★ 高功率脈衝磁控濺鍍
★ 鋁摻雜氧化鋅
★ 窄帶通濾光片
★ 近紅外光

關鍵字(英)

★ HiPIMS
★ AZO
★ NBPF
★ NIR

論文目次

摘要 i
Abstract ii
誌謝 iii
目錄 iv
圖目錄 vi
表目錄 x
第一章、緒論 1
1-1 研究背景 1
1-2 研究動機與目的 3
第二章、基礎理論 4
2-1 材料特性 4
2-1-1 鋁摻雜氧化鋅 (aluminum doped zinc oxide) 4
2-1-2 Drude Lorentz model 6
2-1-3 莫斯-伯斯坦效應 (Burstein-Moss effect) 10
2-1-4 氫化矽(SiH)薄膜 11
2-2 薄膜製程 13
2-2-1 電漿原理 13
2-2-2 物理氣相沉積原理 13
2-2-3 磁控濺鍍 14
2-2-4 高功率脈衝磁控濺鍍系統 15
2-3 多層膜堆設計原理 17
第三章、實驗架構與分析儀器 19
3-1 實驗架構與方法 19
3-1-1 實驗流程 20
3-2 製程設備 22
3-2-1 磁控濺鍍設備 22
3-2-2 HiPIMS 系統 22
3-2-3 紫外光臭氧清洗機(UV Ozone) 24
3-3 分析儀器及軟體 24
3-3-1 紫外/可見/近紅外光光譜儀((UV/VIS/NIR Spectrophotometer) 24
3-3-2 Essential Macleod 25
3-3-3 霍爾量測儀(Hall measurement) 26
3-3-4 X-Ray 繞射分析儀(XRD) 27
3-3-5 拉曼光譜儀(Raman Spectrometer) 27
3-3-6 X射線光電子能譜(X-ray Photoelectron Spectroscopy, XPS) 29
3-3-7 傅立葉轉換紅外光譜儀器(Fourier Transform Infrared Spectroscopy, FTIR) 30
3-3-8 原子力顯微鏡(Atomic Force Microscope, AFM) 33
3-3-9 場發射式掃描電子顯微鏡(Field Emission Scanning Electron Microscope, FE-SEM) 34
3-3-10 能量色散X射線光譜(Energy Dispersive X-ray Spectroscopy, EDS) 35
3-3-11 高解析掃描穿透式電子顯微鏡(High Resolution Scanning Transmission Electron Microscope, HR-STEM) 35
第四章、實驗結果 37
4-1 Al不同摻雜比例之光學及電學特性 37
4-1-1 調變不同鋁片數目 37
4-1-2 調變不同氧氣通量 40
4-1-3 調變RTA 快速熱退火溫度 45
4-2 AZO (ZnO : Al2O3 = 98 : 2 wt%)混合靶之光學及電學特性 49
4-2-1 調變不同氧氣通量 49
4-2-2 不同duty cycle 59
4-2-3 RTA快速熱退火之變化 66
4-3 SiH之光學特性 69
4-3-1 UV Ozone前處理之影響 69
4-3-2 不同氫氣通量對SiH之影響 70
4-3-3 RTA快速熱退火之變化 74
4-4 NBPF 77
4-4-1 HLH介面層 77
4-4-2 Duty Cycle 50% 1310 NBPF堆疊 78
4-4-3 Duty Cycle 7.14% 1310 NBPF堆疊 82
4-4-4 多層膜快速熱退火之變化 86
第五章、結論與未來展望 90
5-1 實驗結論 90
5-2 未來展望 91
參考文獻 92

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指導教授

陳昇暉(Sheng-Hui Chen)

審核日期

2024-7-30

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