| 姓名 |
曾仲緯(Tzeng,Zhong-Wei)
查詢紙本館藏 |
畢業系所 |
照明與顯示科技研究所 |
| 論文名稱 |
波前檢測器光源校正演算法
(Wavefront Sensor Light Source Calibration Algorithm)
|
| 相關論文 | |
| 檔案 |
 [Endnote RIS 格式]
[Bibtex 格式]
 [相關文章]  [文章引用]  [完整記錄]  [館藏目錄]  至系統瀏覽論文 (2027-8-1以後開放)
|
| 摘要(中) |
隨著 VR產業的高速發展，大型鏡片檢測需求日益增加。然而，
市場上的檢測機器往往難以滿足對大型鏡片的全面檢測需求，尤其是
要實現高速且精確的量測。為了解決這一問題，本實驗室先前開發一
種自動化波前檢測設備，專門應對小型鏡片的大量檢測需求。該設備
的優勢在於，單一鏡片的量測週期僅需十秒內即可完成，並且採用非
接觸式量測架構，確保在不破壞鏡片的情況下進行量測，即使檢測完
畢，鏡片仍可直接用於光學元件上。
本研究的目標是解決使用波前檢測器（ Shack-Hartman Wavefront Sensor）量測大型透鏡時所需的昂貴大口徑光源 問題。為此，本論文
提出使用軟體校正硬體不足的方法，並利用微分光線追跡技術來校正
光源的像差，以模擬接近完美的光源。我們從設計離軸拋物面鏡開
始，並利用微分光線追跡（ Differential Ray Tracing）進行校正，進一
步完善光源系統。這項研究的成果將有助於降低大型光學系統測量成
本，同時提高測量的準確性和可靠性。 |
| 摘要(英) |
With the rapid development of the VR industry, the demand for inspecting large lenses is increasing. However, current market inspection machines often struggle to fully and accurately measure large lenses at high speeds. To address this issue, our laboratory previously developed an automated wavefront detection device designed to efficiently handle the high-volume inspection of small lenses. This device offers the advantage of completing a measurement cycle for a single lens in less than ten seconds and employs a non-contact measurement structure, ensuring that the lens remains undamaged and can be directly used in optical components post-inspection. The goal of this research is to address the high cost of large-aperture light sources required for measuring large lenses using a Shack-Hartmann Wavefront Sensor. To achieve this, the paper proposes using software to correct hardware deficiencies and employing differential ray tracing technology to correct the light source aberrations, thereby simulating an almost perfect light source. We start by designing an off-axis parabolic mirror and then use differential ray tracing to make the necessary corrections, further improving the light source system. The results of this study will help reduce the measurement costs of large optical systems while enhancing measurement accuracy and reliability. |
| 關鍵字(中) |
★ 波前檢測器
★ 光源校正
★ 光線追跡 |
關鍵字(英) |
|
| 論文目次 |
摘要 i
Abstract ii
致謝 iii
目錄 iv
圖目錄 vii
表目錄 x
一、 緒論 1
1-1 研究背景 1
1-2 文獻回顧 2
1-3 研究動機 3
二、 研究內容及方法 4
2-1 Shack-Hartmann波前檢測器 4
2-1-1 量測原理介紹 5
2-1-2 光點指派法 6
2-1-3 光點質心計算法 7
2-1-4 焦點絕對位置量測 8
2-1-5 波前重建 9
2-2 光學理論 11
2-2-1 像差 11
2-2-2 Zernike像差多項式 13
2-2-3 微分光線追跡演算法 14
2-2-4 ABCD矩陣 17
三、 實驗方法 19
3-1 實驗架構 19
3-1-1 Shack-Hartmann波前檢測器硬體架構 19
3-1-2 波前檢測器之光源系統 20
3-2 量測系統校正流程 21
3-3 ABCD矩陣係數 22
3-4 光源取樣 25
四、 實驗結果與分析 26
4-1 實驗流程 27
4-2 實驗前置步驟 29
4-3 Lens1數據比對 30
4-4 Lens2數據比對 38
4-5 Lens3數據比對 44
4-6 Lens4數據比對 50
五、 結論 56
參考文獻 57 |
| 參考文獻 |
[1] D. Malacara-Doblado and I. Ghozeil, "Hartmann, Hartmann-Shack, and other screen tests," Optical Shop Testing 3, 361-397 (2007). [2] D. Malacara, Optical shop testing (John Wiley & Sons, 2007), Vol. 59. [3] B. C. Platt and R. Shack, "History and principles of Shack-Hartmann wavefront sensing," (SLACK Incorporated Thorofare, NJ, 2001). [4] J. Lee, R. V. Shack, and M. R. J. A. o. Descour, “Sorting method to extend the dynamic range of the Shack–Hartmann wave-front sensor,” 44, 4838-4845 (2005). [5] H. Tsutsumi, K. Yoshizumi, and H. Takeuchi, "Ultrahighly accurate 3D profilometer," in Optical Design and Testing II, (International Society for Optics and Photonics, 2005), 387-394. [6] 超高精度三次元測定機 擷取自 https://www.horipla.co.jp/machine/ [7] Bryan D. Stone, 擷取自 chrome-extension://efaidnbmnnnibpcajpcglclefindmkaj/https://www.synopsys.com/content/dam/synopsys/optical-solutions/documents/whitepapers/differential-ray-tracing.pdf (April 2012) [8] Spherical Aberration, 擷取自 https://photographylife.com/what-is-spherical-aberration [9] contributors, W. Zernike polynomials. 22 March 2021 11:49 UTC; Available from: https://en.wikipedia.org/w/index.php?title=Zernike_polynomials&oldid=1013580745. |
| 指導教授 |
梁肇文(Liang,Chao-Wen)
|
審核日期 |
2024-8-8 |
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