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    請使用永久網址來引用或連結此文件: https://ir.lib.ncu.edu.tw/handle/987654321/100099


    題名: Ni interdiffusion coefficient and activation energy in Cu 6Sn 5
    作者: 劉正毓;Huang, Kuan-Chih;Shieu, Fuh-Sheng;Hsiao, Y. H.;Liu, C. Y.
    貢獻者: 工學院化學工程與材料工程學系
    關鍵詞: Applied sciences;Characterization and Evaluation of Materials;Chemical interdiffusion;diffusion barriers;Chemistry and Materials Science;Condensed matter: structure, mechanical and thermal properties;Cross-disciplinary physics: materials science;rheology;Deposition by sputtering;Diffusion in solids;Electronics;Electronics and Microelectronics;Exact sciences and technology;Instrumentation;Liquid phase epitaxy;deposition from liquid phases (melts, solutions, and surface layers on liquids);Materials;Materials Science;Methods of deposition of films and coatings;film growth and epitaxy;Optical and Electronic Materials;Physics;Solid State Physics;Transport properties of condensed matter (nonelectronic)
    日期: 2012-01-01
    上傳時間: 2026-04-21 13:49:15 (UTC+8)
    出版者: Springer New York;Boston: Springer Science and Business Media LLC
    摘要: 摘要: Ni diffusion in Cu 6 Sn 5 intermetallic compound was investigated. First, we successfully fabricated preferred-orientation Cu 6 Sn 5 crystal by liquid-phase electroepitaxy (LPEE). Then, Ni/Cu 6 Sn 5 diffusion couples were produced by sputtering from a Ni thin film onto the Cu 6 Sn 5 crystal. Ni/Cu 6 Sn 5 diffusion couples were annealed at different temperatures of 120°C, 160°C, 200°C, 255°C, 290°C, and 320°C for 2 h in a vacuum. The Ni atomic profile across the Ni/Cu 6 Sn 5 interface was obtained by electron spectroscopy for chemical analysis (ESCA). From the Ni atomic profiles, the Matano method was used to evaluate the Ni interdiffusion coefficients ( ) in the Cu 6 Sn 5 crystal obtained with different annealing temperatures, which then yields the activation energy for Ni diffusion in the Cu 6 Sn 5 crystal at a particular Ni content. We found that, as Ni diffuses in the ternary Cu 6− x Ni x Sn 5 compound phase, the activation energy of Ni interdiffusion decreases with the Ni content.
    其他題名: Journal of Elec Materi
    出版者: Boston: Springer Science and Business Media LLC
    出版日期: 2012-01-01
    出處: Journal of Electronic Materials, 2012-01, Vol.41 (1), p.172-175
    資源來源: EBSCOhost OmniFile Full Text Select
    版權: TMS 2011
    版權: 2015 INIST-CNRS
    識別號: ISSN: 0361-5235
    識別號: EISSN: 1543-186X
    識別號: DOI: 10.1007/s11664-011-1821-8
    識別號: CODEN: JECMA5
    顯示於類別:[化學工程與材料工程學系 ] 期刊論文

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