Electrochemical Cu growth on MPS-modified Au(111) electrodes

Please use this identifier to cite or link to this item: https://ir.lib.ncu.edu.tw/handle/987654321/100327

Title:	Electrochemical Cu growth on MPS-modified Au(111) electrodes
Authors:	姚學麟;Krug, Klaus;Liu, Yung-Fang;Ho, Wen-Hsiang;Lee, Yuh-Lang;Dow, Wei-Ping;Yau, Shueh-Lin
Contributors:	理學院化學學系
Keywords:	Analytical chemistry;Chemistry;Cross-disciplinary physics: materials science;rheology;Electrochemical methods;Electrodeposition, electroplating;Exact sciences and technology;Materials science;Methods of deposition of films and coatings;film growth and epitaxy;Physics
Date:	2012-08-23
Issue Date:	2026-04-21 13:57:48 (UTC+8)
Publisher:	American Chemical Society;Columbus, OH: American Chemical Society
Abstract:	摘要： Au(111) electrodes have been modified with self-assembled monolayers (SAM) of 3-mercapto-1-propanesulfonic acid (MPS) and used as a substrate for Cu electrodeposition. Aqueous plating solutions contained 0.1 M H2SO4, low Cu concentrations (≤80 μM), and, optionally, 1.4 mM Cl ions. The deposition process was characterized by cyclic voltammetry (CV) and in-situ scanning tunneling microscopy (STM) as a function of the electrode potential. At potentials positive of Cu growth (≥0.7 VRHE), freshly modified electrodes are covered by an ordered (5√3 × √21) MPS adlayer (α) both in Cl-free and Cl-containing electrolytes. The α adlayer becomes disordered at more negative potentials prior to the onset of Cu deposition (≤0.65 VRHE). In the potential regime of Cu underpotential deposition (UPD) (≈0.2–0.65 VRHE), the surface morphology strongly depends on the presence of Cl. In the absence of Cl, a transient, ordered Cu/MPS adlayer phase (δ) forms via 2D growth and covers the entire Au(111) surface. Subsequently, the δ phase transforms into a disordered Cu/MPS phase (σCu) with small, embedded Cu islands. In Cl-containing electrolyte, a disordered Cu/MPS/Cl phase (γ) nucleates at Au step edges or surface defects and spreads laterally. Cu islands form simultaneously within the γ phase. Two-dimensional growth of these islands results in a pure Cu-UPD layer. Overpotential deposition (OPD) proceeds via layer-by-layer mode with second layer nucleations at surprisingly small critical coverages (θC ≪ 0.5). Our observations differ significantly from those in previous studies, demonstrating that the Cu growth behavior critically depends on the concentrations of MPS, Cu, and Cl at the interface. 其他題名： J. Phys. Chem. C 出版者： Columbus, OH: American Chemical Society 出版日期： 2012-08-23 出處： Journal of physical chemistry. C, 2012-08, Vol.116 (33), p.17507-17517 資源來源： ACS (American Chemical Society) 化學中心聯盟期刊版權： Copyright © 2012 American Chemical Society 版權： 2015 INIST-CNRS 識別號： ISSN: 1932-7447 識別號： EISSN: 1932-7455 識別號： DOI: 10.1021/jp302406e
Appears in Collections:	[Department of Chemistry] journal & Dissertation

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