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    Please use this identifier to cite or link to this item: https://ir.lib.ncu.edu.tw/handle/987654321/100338


    Title: Morphology and field-effect transistor characteristics of semicrystalline poly(3-hexylthiophene) and poly(stearyl acrylate) blend nanowires
    Authors: 孫亞賢;Lin, Jung-Chuan;Lee, Wen-Ya;Wu, Hung-Chin;Chou, Chih-Chieh;Chiu, Yu-Cheng;Sun, Ya-Sen;Chen, Wen-Chang
    Contributors: 工學院化學工程與材料工程學系
    Keywords: Blends;Charge transport;Devices;Morphology;Nanowires;Polymethyl methacrylates;Semiconductor devices
    Date: 2012-08-07
    Issue Date: 2026-04-21 13:58:08 (UTC+8)
    Publisher: Royal Society of Chemistry
    Abstract: 摘要: The morphology and charge transport characteristics of semicrystalline poly(3-hexylthiophene) (P3HT) and semicrystalline poly(stearyl acrylate) (PSA) or amorphous poly(methyl methacrylate) (PMMA) with various blending ratios were systematically investigated using different solvents. The P3HT-PSA films prepared from CH sub(2)Cl sub(2) formed well-defined P3HT nanowires with an average diameter of 30 nm, which was larger than that ( similar to 14 nm) of the P3HT-PMMA films, as evidenced by TEM and AFM. The P3HT-PSA nanowire based field effect transistors (FET) could achieve a high hole mobility of 3.2 10 super(-3) cm super(2) V super(-1) s super(-1) using only 2 wt% P3HT composition. The maximum FET mobility of 7.86 10 super(-3) cm super(2) V super(-1) s super(-1) with the on/off ratio of 10 super(5) was obtained in the 10 wt% P3HT-PSA blends, which were higher than those of pristine P3HT and P3HT-PMMA devices. The semicrystalline PSA probably facilitated large P3HT crystallites and led to high FET mobility. Also, the P3HT-PSA FET devices showed lower percolation threshold and better ambient stability than the P3HT-PMMA devices. These results indicated that the crystalline non-conjugated polymers played a critical role in the charge transport and air stability of FETs based on conjugated polymer blends.
    出版日期: 2012-01-01
    出處: Journal of materials chemistry, 2012-01, Vol.22 (29), p.14682-14690
    資源來源: Alma/SFX Local Collection
    識別號: ISSN: 0959-9428
    識別號: EISSN: 1364-5501
    識別號: DOI: 10.1039/c2jm31362f
    Appears in Collections:[Department of Chemical and Materials Engineering] journal & Dissertation

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