Surface relief terraces and self-assembled nanostructures in thin block copolymer films with solvent annealing

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Please use this identifier to cite or link to this item: https://ir.lib.ncu.edu.tw/handle/987654321/100373

Title:	Surface relief terraces and self-assembled nanostructures in thin block copolymer films with solvent annealing
Authors:	孫亞賢;Guo, Zhen-Yuan;Lin, Mei-Syun;Chang, Yang-Ting;Sun, Ya-Sen;Chiang, Yeo-Wan;Chou, Chung-Yi;Woon, Wei-Yen;Chuang, Min-Chiang
Contributors:	工學院化學工程與材料工程學系
Keywords:	annealing;Applied sciences;Block copolymers;butanol;Exact sciences and technology;GISAXS;nanospheres;Organic polymers;Phase transitions;Physicochemistry of polymers;polymers;Properties and characterization;silicon;Surface properties;toluene;vapors
Date:	2012-09-28
Issue Date:	2026-04-21 13:59:34 (UTC+8)
Publisher:	Elsevier BV;Kidlington: Elsevier Ltd
Abstract:	摘要： We have investigated the temporal evolution of relief terraces and microphase-separated nanodomains in poly(styrene-block-ethylene oxide) P(S-b-EO) on silicon substrates (SiOx/Si) annealed under toluene/butanol vapors. For thin films, solvent annealing causes the formation of relief terraces. With solvent annealing for 12 h, hexagonal arrays of nanospheres of three sizes are dominant over the surface morphology of relief-terraced microstructures with epitaxial packing. The coexistence of nanospheres of three sizes is ascribed to a morphology triggered by the constraint of the film thickness. Upon exposure to toluene/butanol vapors for 16 and 20 h, these nanospheres become metastable and grow further into nanocylinders lying on the surface. During dewetting, the undulations of the local thickness and the nanodomain transitions are inseparable, consequently forming relief terraces comprising multiple layers of lying nanocylinders. The mechanisms and causes of nanodomain transitions of varied routes in solvent-annealed P(S-b-EO) films are analyzed and discussed. [Display omitted] 出版者： Kidlington: Elsevier Ltd 出版日期： 2012-09-28 出處： Polymer (Guilford), 2012-09, Vol.53 (21), p.4827-4833 版權： 2012 Elsevier Ltd 版權： 2015 INIST-CNRS 識別號： ISSN: 0032-3861 識別號： EISSN: 1873-2291 識別號： DOI: 10.1016/j.polymer.2012.08.051 識別號： CODEN: POLMAG
Appears in Collections:	[Department of Chemical and Materials Engineering] journal & Dissertation

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