Bandgap narrowing in high dopant tin oxide degenerate thin film produced by atmosphere pressure chemical vapor deposition

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Title:	Bandgap narrowing in high dopant tin oxide degenerate thin film produced by atmosphere pressure chemical vapor deposition
Authors:	吳子嘉;Lin, Yang-Yi;Lee, Hsin-Yi;Ku, Ching-Shun;Chou, Li-Wei;Wu, Albert T.
Contributors:	工學院化學工程與材料工程學系
Date:	2013-03-18
Issue Date:	2026-04-21 14:09:26 (UTC+8)
Publisher:	AIP Publishing
Abstract:	摘要： Antimony-doped tin oxide (SnO2:Sb) thin films were prepared by atmospheric pressure chemical vapor deposition. Precursors were mixed with gaseous SnCl4, SbCl5, and oxygen. Both antimony and chlorine ions became involved in doping and reduced resistivity. The figure of merit suggested that films deposited at 500 °C with the ratio of SnCl4/SbCl5 equals to 0.5 have the best quality. The dopant in the degenerate films narrowed the bandgap because of interaction between electrons and impurities. A mathematical model of the shifting in bandgap is proposed with the consideration of the effective mass of the carriers and well fitted to the experimental results. 出版者： AIP Publishing 出版日期： 2013-03-18 出處： Applied Physics Letters, 2013-03, Vol.102 (11) 資源來源： AIP Publishing 識別號： ISSN: 0003-6951 識別號： EISSN: 1077-3118 識別號： DOI: 10.1063/1.4798253
Appears in Collections:	[Department of Chemical and Materials Engineering] journal & Dissertation

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