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    Please use this identifier to cite or link to this item: https://ir.lib.ncu.edu.tw/handle/987654321/100922


    Title: Electrochemical properties of an AgInS2 photoanode prepared using ultrasonic-assisted chemical bath deposition
    Authors: 李岱洲;Lee, Fang-Yun;Yang, Kai-Yu;Wang, Yi-Chen;Li, Chien-Hung;Lee, T. Randall;Lee, Tai-Chou
    Contributors: 工學院化學工程與材料工程學系
    Keywords: capacitance;coatings;electrochemistry;electrodes;electrolytes;energy;heat treatment;light intensity;lighting;photochemistry;semiconductors;sulfides
    Date: 2014-01-01
    Issue Date: 2026-04-21 14:18:28 (UTC+8)
    Publisher: Royal Society of Chemistry
    Abstract: 摘要: This study focuses on preparing a AgInS 2 film electrode and studying its electrochemical properties. The AgInS 2 film after 400 °C thermal treatment had the orthorhombic structure and a direct energy band gap of 1.98 eV. The thickness of AgInS 2 film used in this study was 758.9 ± 40.9 nm. In order to understand the photoelectrochemical properties, electrochemical impedances of the AgInS 2 photoanode in response to a light intensity of 75 mW cm −2 were scrutinized. It was found that homogeneous AgInS 2 films were obtained with increasing coatings. In addition, these dense films can effectively suppress the dark current. Charge transfer resistance and space charge capacitance can be retrieved from impedance spectra by fitting the experimental data to the models. In fact, Randle's model fitted the data better than other complicated models. Under illumination, the space charge capacitance and charge transfer resistance are strongly correlated to the onset of the photo-enhanced current density, suggesting a direct carrier transfer to the electrolyte from the valence band of the semiconductor photoanode, rather than from the surface states.
    出版日期: 2014-01-01
    出處: RSC advances, 2014-01, Vol.4 (66), p.35215-35223
    資源來源: Royal Society of Chemistry
    識別號: ISSN: 2046-2069
    識別號: EISSN: 2046-2069
    識別號: DOI: 10.1039/C4RA01728E
    Appears in Collections:[Department of Chemical and Materials Engineering] journal & Dissertation

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