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    Please use this identifier to cite or link to this item: https://ir.lib.ncu.edu.tw/handle/987654321/103018


    Title: Low-temperature synthesis of graphene on Cu using plasma-assisted thermal chemical vapor deposition
    Authors: 李孟錡;Chan, Shih-Hao;Chen, Sheng-Hui;Lin, Wei-Ting;Li, Meng-Chi;Lin, Yung-Chang;Kuo, Chien-Cheng
    Contributors: 光電科學研究中心
    Keywords: Chemistry and Materials Science;Condensed Matter Physics;Emission measurements;Low temperature;Materials Science;Materials Science(all);Molecular Medicine;Nano Express;Nanochemistry;Nanoscale Science and Technology;Nanotechnology;Nanotechnology and Microengineering
    Date: 2013-01-01
    Issue Date: 2026-04-23 11:21:56 (UTC+8)
    Publisher: Springer New York;New York: Springer Science and Business Media LLC
    Abstract: 摘要: AbstractPlasma-assisted thermal chemical vapor deposition (CVD) was carried out to synthesize high-quality graphene film at a low temperature of 600°C. Monolayer graphene films were thus synthesized on Cu foil using various ratios of hydrogen and methane in a gaseous mixture. The in situ plasma emission spectrum was measured to elucidate the mechanism of graphene growth in a plasma-assisted thermal CVD system. According to this process, a distance must be maintained between the plasma initial stage and the deposition stage to allow the plasma to diffuse to the substrate. Raman spectra revealed that a higher hydrogen concentration promoted the synthesis of a high-quality graphene film. The results demonstrate that plasma-assisted thermal CVD is a low-cost and effective way to synthesis high-quality graphene films at low temperature for graphene-based applications.
    其他題名: Nanoscale Res Lett
    出版者: New York: Springer Science and Business Media LLC
    出版日期: 2013-06-12
    出處: Nanoscale Research Letters, 2013-06, Vol.8 (1), p.285--285, Article 285
    資源來源: ProQuest Open Access Content Collection
    版權: Chan et al.; licensee Springer. 2013. This article is published under license to BioMed Central Ltd. This is an Open Access article distributed under the terms of the Creative Commons Attribution License ( ), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
    版權: The Author(s) 2013
    版權: Copyright ©2013 Chan et al.; licensee Springer. 2013 Chan et al.; licensee Springer.
    識別號: ISSN: 1556-276X
    識別號: ISSN: 1931-7573
    識別號: EISSN: 1556-276X
    識別號: DOI: 10.1186/1556-276x-8-285
    識別號: PMID: 23758668
    Appears in Collections:[Optical Sciences Center] journal & Dissertation

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