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    Please use this identifier to cite or link to this item: https://ir.lib.ncu.edu.tw/handle/987654321/103144


    Title: Characterization of the cleaning process on a transferred graphene
    Authors: 簡汎清;Huang, Li-Wei;Chang, Cheng-Kai;Chien, Fan-Ching;Chen, Kuei-Hsien;Chen, Peilin;Chen, Fu-Rong;Chang, Chia-Seng
    Contributors: 理學院光電科學與工程學系
    Keywords: CHEMICAL PROPERTIES;COPPER;GRAPHENE;INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;NANOPARTICLES;PRESSURE RANGE NANO PA;TRANSMISSION ELECTRON MICROSCOPY
    Date: 2014-01-01
    Issue Date: 2026-04-23 11:24:14 (UTC+8)
    Publisher: AVS Science and Technology Society;United States
    Abstract: 摘要: Intrinsic graphene possesses many outstanding physical and chemical properties, but their full explorations are often hindered by the effects of substrate and/or contamination. The authors employ the ultrahigh vacuum transmission electron microscopy equipped with a residual gas analyzer to in-situ characterize an effective decontamination process on a suspended graphene. Raman spectroscopic spectra further verify the cleanness of the resultant graphene membrane. The authors also present two contrasting growth morphologies of copper nanoparticles obtained on both clean and unclean graphene surfaces and show that the intrinsic growth dynamics can only manifest on the surface without contaminations.
    出版者: United States
    出版日期: 2014-09-01
    出處: Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2014-09, Vol.32 (5)
    資源來源: AIP Journals (American Institute of Physics)
    識別號: ISSN: 0734-2101
    識別號: EISSN: 1520-8559
    識別號: DOI: 10.1116/1.4886735
    Appears in Collections:[Department of Optics and Photonics] journal & Dissertation

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