Design of multifold Ge/Si/Ge composite quantum-dot heterostructures for visible to near-infrared photodetection

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Title:	Design of multifold Ge/Si/Ge composite quantum-dot heterostructures for visible to near-infrared photodetection
Authors:	李勝偉;Kuo, Ming-Hao;Lai, Wei-Ting;Lee, Sheng-Wei;Chen, Yen-Chun;Chang, Chia-Wei;Chang, Wen-Hao;Hsu, Tzu-Min;Li, Pei-Wen
Contributors:	工學院材料科學與工程研究所
Keywords:	Crystal structure;Germanium;Heterostructures;Optical interconnects;Quantum dots;Self assembly;Silicon;Thin films
Date:	2015-01-01
Issue Date:	2026-04-23 11:30:25 (UTC+8)
Publisher:	The Optical Society;United States
Abstract:	摘要： We demonstrate an effective approach to grow high-quality thin film (>1 μm) of multifold Ge/Si/Ge composite quantum dots (CQDs) stacked heterostructures for near infrared photodetection and optical interconnect applications. An otherwise random, self-assembly of variable-fold Ge/Si CQDs has been grown on Si through the insertion of Si spacer layers to produce micron-scale-thick, stacked Ge/Si CQD layers with desired QD morphology and composition distribution. The high crystalline quality of these multifold Ge CQD heterostructures is evidenced by low dark current density of 3.68 pA/μm2, superior photoresponsivity of 267 and 220 mA/W under 850 and 980 nm illumination, respectively, and very fast temporal response time of 0.24 ns measured on the Ge/Si CQD photodetectors. 其他題名： Opt Lett 出版者： United States 出版日期： 2015-05-15 出處： Optics letters, 2015-05, Vol.40 (10), p.2401-2404 資源來源： Optica Publishing Group Journals 識別號： ISSN: 0146-9592 識別號： ISSN: 1539-4794 識別號： EISSN: 1539-4794 識別號： DOI: 10.1364/OL.40.002401 識別號： PMID: 26393750
Appears in Collections:	[Institute of Materials Science and Engineering] journal & Dissertation

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