Formation mechanism of SiGe nanorod arrays by combining nanosphere lithography and Au-assisted chemical etching

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Title:	Formation mechanism of SiGe nanorod arrays by combining nanosphere lithography and Au-assisted chemical etching
Authors:	李勝偉;Lai, Chih-Chung;Lee, Yun-Ju;Yeh, Ping-Hung;Lee, Sheng-Wei
Contributors:	工學院材料科學與工程研究所
Keywords:	Arrays;Chemical etching;Chemistry and Materials Science;Condensed Matter Physics;Electron microscopy;Etching;General Materials Science;High temperature;INEC 2011;Lithography;Materials Science;Molecular Medicine;Morphology;Nano Express;Nanochemistry;Nanorods;Nanoscale Science and Technology;Nanospheres;Nanotechnology;Nanotechnology and Microengineering;Redox reactions;Scanning electron microscopy;Silicon germanides;Temperature dependence;Transmission electron microscopy
Date:	2012-01-01
Issue Date:	2026-04-23 11:35:34 (UTC+8)
Publisher:	Springer New York;New York: Springer Science and Business Media LLC
Abstract:	摘要： AbstractThe formation mechanism of SiGe nanorod (NR) arrays fabricated by combining nanosphere lithography and Au-assisted chemical etching has been investigated. By precisely controlling the etching rate and time, the lengths of SiGe NRs can be tuned from 300 nm to 1μm. The morphologies of SiGe NRs were found to change dramatically by varying the etching temperatures. We propose a mechanism involving a locally temperature-sensitive redox reaction to explain this strong temperature dependence of the morphologies of SiGe NRs. At a lower etching temperature, both corrosion reaction and Au-assisted etching process were kinetically impeded, whereas at a higher temperature, Au-assisted anisotropic etching dominated the formation of SiGe NRs. With transmission electron microscopy and scanning electron microscopy analyses, this study provides a beneficial scheme to design and fabricate low-dimensional SiGe-based nanostructures for possible applications. 其他題名： Nanoscale Res Lett 出版者： New York: Springer Science and Business Media LLC 出版日期： 2012-02-18 出處： Nanoscale Research Letters, 2012-02, Vol.7 (1), p.140-140, Article 140 資源來源： Publicly Available Content Database (Proquest) 版權： Lai et al; licensee Springer. 2012. This article is published under license to BioMed Central Ltd. This is an Open Access article distributed under the terms of the Creative Commons Attribution License ( ), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. 版權： Copyright Springer Nature B.V. Dec 2012 版權： Copyright ©2012 Lai et al; licensee Springer. 2012 Lai et al; licensee Springer. 識別號： ISSN: 1556-276X 識別號： ISSN: 1931-7573 識別號： EISSN: 1556-276X 識別號： DOI: 10.1186/1556-276x-7-140 識別號： PMID: 22340729
Appears in Collections:	[Institute of Materials Science and Engineering] journal & Dissertation

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