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    請使用永久網址來引用或連結此文件: https://ir.lib.ncu.edu.tw/handle/987654321/103730


    題名: Improved light reflectance and thermal stability of Ag-based ohmic contacts on p-type GaN with la additive
    作者: 陳一塵;Chen, I-Chen;Cheng, Bo-Yuan;Ke, Wen-Cheng;Kuo, Cheng-Huang;Chang, Li-Chuan
    貢獻者: 工學院材料科學與工程研究所
    關鍵詞: Additives;Annealing;Contact resistance;La additive;Light reflectance;Migration;Ohmic contact;Reflectance;Reflectivity;Silver;Specific contact resistivity;Thermal stability
    日期: 2013-03-15
    上傳時間: 2026-04-23 11:36:21 (UTC+8)
    出版者: Academic Press Inc.;Elsevier Ltd
    摘要: 摘要: ► We report a new Ag-based p-type GaN contact with La additive. ► A high reflectance and low contact resistivity were obtained from Ag–La contacts. ► The Ag–La contact shows better thermal stability than the Ag contact. ► The addition of La could effectively suppress the Ag agglomeration during annealing. We investigated the effect of La additive on the improvement of light reflectance and thermal stability of Ag contacts on p-GaN. A high reflectance of over 90% at 460nm wavelength and low specific contact resistivity of 5.5×10−5Ωcm2 were obtained from La-containing Ag contacts annealed at 300°C for 1min, which also show better thermal stability than Ag contacts after annealing in air ambient. The experimental results reveal that the addition of La could effectively slow down Ag migration in 〈111〉 direction during annealing, and thus suppress the Ag agglomeration at elevated temperature, leading to a good ohmic contact with improved high reflectance and thermal stability.
    出版者: Elsevier Ltd
    出版日期: 2013-05-01
    出處: Superlattices and microstructures, 2013-05, Vol.57, p.51-57
    版權: 2013 Elsevier Ltd
    識別號: ISSN: 0749-6036
    識別號: EISSN: 1096-3677
    識別號: DOI: 10.1016/j.spmi.2013.02.002
    顯示於類別:[材料科學與工程研究所 ] 期刊論文

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