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    請使用永久網址來引用或連結此文件: https://ir.lib.ncu.edu.tw/handle/987654321/103746


    題名: Influence of annealing on microstructural and photoelectrochemical characteristics of CuSCN thin films via electrochemical process
    作者: 林景崎;Huang, Mao-Chia;Wang, TsingHai;Tseng, Yao-Tien;Wu, Ching-Chen;Lin, Jing-Chie;Hsu, Wan-Yi;Chang, Wen-Sheng;Chen, I-Chen;Peng, Kun-Cheng
    貢獻者: 工學院材料科學與工程研究所
    關鍵詞: Alloys;Annealing;Annealing effect;CuSCN;Density;Diffraction;Electrochemically deposition;Glass;Photocurrent;Photoelectric effect;Photoelectrochemistry;Thin films;Water splitting
    日期: 2015-02-15
    上傳時間: 2026-04-23 11:36:40 (UTC+8)
    出版者: Elsevier BV;Elsevier B.V
    摘要: 摘要: •CuSCN films were synthesized by electrochemical process.•The parameter of CuSCN films was annealing temperature.•The photoelectrochemical characteristics of CuSCN films were investigated. Thin films of p-type β-CuSCN were deposited on indium–tin oxide glass substrates via electrochemical process. Various annealing temperatures (200, 300 and 400°C) were taken into consideration. The influence of annealing temperature on structural, optical, electrical and photoelectrochemical characteristics of β-CuSCN thin films were investigated. Results from X-ray diffraction indicated as-obtained β-CuSCN thin film was in a hexagonal close pack crystal structure. We found that the crystallographic orientation changed and the optical energy band gap slightly increased with increasing annealing temperatures. These properties made CuSCN films annealed at 400°C a better photoelectrochemical performance with photocurrent density of about −0.39mA/cm2 at −0.5V vs. SCE. This value is about 5 times higher than the as-deposited CuSCN film. Observed higher photocurrent density is likely due to the intrinsic of a higher charge carrier concentration, and a lower resistance within CuSCN crystal and at CuSCN/electrolyte interface.
    出版者: Elsevier B.V
    出版日期: 2015-02-15
    出處: Journal of alloys and compounds, 2015-02, Vol.622, p.669-675
    版權: 2014 Elsevier B.V.
    識別號: ISSN: 0925-8388
    識別號: EISSN: 1873-4669
    識別號: DOI: 10.1016/j.jallcom.2014.10.147
    顯示於類別:[材料科學與工程研究所 ] 期刊論文

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