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    請使用永久網址來引用或連結此文件: https://ir.lib.ncu.edu.tw/handle/987654321/103778


    題名: Interfacial phenomena in hematite photoanodes fabricated by directly associating iron oxide suspensions with FTO substrates using a dipping-annealing method
    作者: 林景崎;Wang, TsingHai;Huang, Mao-Chia;Liu, Fu-Wei;Hsieh, Yi-Kong;Chang, Wen-Sheng;Lin, Jing-Chie;Wang, Chu-Fang
    貢獻者: 工學院材料科學與工程研究所
    關鍵詞: capacitance;Dipping;hematite;iron;nanoparticles;nanospheres;photocatalysis;semiconductors
    日期: 2014-01-06
    上傳時間: 2026-04-23 11:37:24 (UTC+8)
    出版者: Royal Society of Chemistry
    摘要: 摘要: The fabrication of solid semiconductor nanoparticles on conductive substrates while retaining their high photocatalytic activity as they were in the dispersed form remains a challenge. In this study, we adopted the idea of used a dipping-annealing (DA) method to associate solid iron oxide nanoparticles directly onto an FTO substrate. We focused on the interfacial phenomenon of the as-fabricated hematite photoanodes to evaluate factors that may affect their photocatalytic performance. A significant sintering effect occurs during calcination; this process converts the iron (hydro)oxide precursor into a hematite structure and removes binder molecules. This sintering effect is more severe for the nanocubes than the nanospheres. However, the sintering effect would induce a size effect, further compromising the photocatalytic performance of the prepared photoanodes. Based on EIS analyses, the deteriorated photocatalytic performance arises from the deactivation that occurs at the exposed facet, increasing the open circuit potential and the resistance of hematite bulk, as well as decreasing the capacitance at the hematite-electrolyte interface.
    出版日期: 2014-01-01
    出處: RSC advances, 2014-01, Vol.4 (9), p.4463-4471
    資源來源: Royal Society of Chemistry
    識別號: ISSN: 2046-2069
    識別號: EISSN: 2046-2069
    識別號: DOI: 10.1039/C3RA45692G
    顯示於類別:[材料科學與工程研究所 ] 期刊論文

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