Nanopatterned silicon substrate use in heterojunction thin film solar cells made by magnetron sputtering

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題名:	Nanopatterned silicon substrate use in heterojunction thin film solar cells made by magnetron sputtering
作者:	陳昇暉;Chan, Chia-Hua;Wei, Hung-Sen;Lin, Chang-Rong;Tseng, Shao-Ze;Chen, Sheng-Hui
貢獻者:	理學院光電科學與工程學系
關鍵詞:	Chemical vapor deposition;Heterojunctions;Monomolecular films;Nanostructure;Photovoltaic cells;Silicon;Silicon substrates;Silicon wafers;Solar batteries;Solar cells;Solar energy;Thin films;Wafers
日期:	2014-01-01
上傳時間:	2026-04-23 11:37:29 (UTC+8)
出版者:	Hindawi Publishing Corporation;Cairo, Egypt: Hindawi Publishing Corporation
摘要:	摘要： This paper describes a method for fabricating silicon heterojunction thin film solar cells with an ITO/p-type a-Si : H/n-type c-Si structure by radiofrequency magnetron sputtering. A short-circuit current density and efficiency of 28.80 mA/cm2 and 8.67% were achieved. Novel nanopatterned silicon wafers for use in cells are presented. Improved heterojunction cells are formed on a nanopatterned silicon substrate that is prepared with a self-assembled monolayer of SiO2 nanospheres with a diameter of 550 nm used as an etching mask. The efficiency of the nanopattern silicon substrate heterojunction cells was 31.49% greater than that of heterojunction cells on a flat silicon wafer. 出版者： Cairo, Egypt: Hindawi Publishing Corporation 出版日期： 2014-01-01 出處： International Journal of Photoenergy, 2014-01, Vol.2014 (2014), p.1-10 資源來源： ProQuest Open Access Content Collection 版權： Copyright © 2014 Shao-Ze Tseng et al. 版權： COPYRIGHT 2014 John Wiley & Sons, Inc. 版權： COPYRIGHT 2014 Hindawi Limited 版權： Copyright © 2014 Shao-Ze Tseng et al. Shao-Ze Tseng et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. 識別號： ISSN: 1110-662X 識別號： ISSN: 1687-529X 識別號： EISSN: 1687-529X 識別號： DOI: 10.1155/2014/707543
顯示於類別:	[光電科學與工程學系] 期刊論文

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