Wide-angle antireflection ZnO films on bullet-like nanostructures of multi-crystalline silicon

Please use this identifier to cite or link to this item: https://ir.lib.ncu.edu.tw/handle/987654321/104458

Title:	Wide-angle antireflection ZnO films on bullet-like nanostructures of multi-crystalline silicon
Authors:	陳昇暉;Chen, Sheng-Hui;Tseng, Shao-Ze;Chen, Wei;Cho, Wen-Hao;Chan, Chia-Hua
Contributors:	理學院光電科學與工程學系
Keywords:	ANTIREFLECTION COATINGS;CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;CRYSTAL GROWTH;DEPOSITION;ETCHING;INCIDENCE ANGLE;MATERIALS SCIENCE;NANOSTRUCTURES;PLASMA;REFLECTIVITY;SEMICONDUCTOR MATERIALS;SILICON;SILICON OXIDES;SPUTTERING;SUBSTRATES;SURFACES;THIN FILMS;ZINC OXIDES
Date:	2012-01-01
Issue Date:	2026-04-23 11:50:38 (UTC+8)
Publisher:	AVS Science and Technology Society;United States: American Vacuum Society
Abstract:	摘要： Nanosphere lithography and antireflection coating techniques have been applied to fabricate wide-angle antireflection structures on multicrystalline silicon substrates. Self-assembled 550-nm SiO2 nanospheres were arranged periodically to act as a mask to block the inductively coupled plasma dry etching and form bulletlike nanostructures on the surface of the multicrystalline silicon wafer. Then a 65-nm-thick zinc oxide film was deposited on the nanostructures using the atomic layer deposition method. The results show that when applying the nanostructure with a ZnO film the average reflectivity of the multicrystalline silicon wafer can be decreased from 36% to 0.65% in the wavelength range from 400 nm to 850 nm for an incident angle of 8°. When the incident angle reaches 60° the average reflectivity of the sample becomes less than 4.6%. 出版者： United States: American Vacuum Society 出版日期： 2012-01-01 出處： Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, 2012-01, Vol.30 (1), p.01A141-01A141-5 資源來源： AIP Journals (American Institute of Physics) 版權： American Vacuum Society 版權： 2012 American Vacuum Society 識別號： ISSN: 0734-2101 識別號： ISSN: 1553-1813 識別號： EISSN: 1520-8559 識別號： DOI: 10.1116/1.3666040 識別號： CODEN: JVTAD6
Appears in Collections:	[Department of Optics and Photonics] journal & Dissertation

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