Effect of surface steps on the diffusion of adsorbates investigated with angle-resolved photoelectron spectroscopy

Please use this identifier to cite or link to this item: https://ir.lib.ncu.edu.tw/handle/987654321/104550

Title:	Effect of surface steps on the diffusion of adsorbates investigated with angle-resolved photoelectron spectroscopy
Authors:	陸大安;Luh, Dah-An;Chen, Chi-Lu;Liang, Xihui;Cheng, Cheng-Maw;Tsuei, Ku-Ding
Contributors:	理學院物理學系
Keywords:	Adsorbates;Annealing;Condensed matter;Diffusion;Diffusion barriers;Photoelectron spectroscopy;Potential barriers;Thin films
Date:	2012-07-16
Issue Date:	2026-04-23 11:52:18 (UTC+8)
Publisher:	American Physical Society
Abstract:	摘要： To investigate the surface diffusion of chemisorbed H on Ag/Au(111) thin films with surface steps, we characterized the distribution of H atoms on the surface by measuring the Shockley states of these surfaces with angle-resolved photoelectron spectroscopy. Our results show that H atoms tend to diffuse and to remain on the terrace at the lower side of the surface steps during annealing. This diffusive behavior is explained qualitatively through the existence of an Ehrlich-Schwoebel potential barrier associated with the surface steps. 出版日期： 2012-07-16 出處： Physical review. B, Condensed matter and materials physics, 2012-07, Vol.86 (4), Article 045424 識別號： ISSN: 1098-0121 識別號： EISSN: 1550-235X 識別號： DOI: 10.1103/PhysRevB.86.045424
Appears in Collections:	[Department of Physics] journal & Dissertation

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