Graphene reduction dynamics unveiled

Please use this identifier to cite or link to this item: https://ir.lib.ncu.edu.tw/handle/987654321/104848

Title:	Graphene reduction dynamics unveiled
Authors:	溫偉源;Tsai, Hung-Chieh;Shiu, Hung-Wei;Chuang, Min-Chiang;Chen, Chia-Hao;Su, Ching-Yuan;David White, Jonathon;Yen Woon, Wei
Contributors:	理學院物理學系
Keywords:	Carbon-carbon composites;Chemical vapor deposition;Constraining;defects;Dynamics;Graphene;Lithography;photoelectron spectroscopy;Rate constants;Reduction;scanning probe lithography
Date:	2015-08-06
Issue Date:	2026-04-23 11:59:43 (UTC+8)
Publisher:	IOP Publishing Ltd.;IOP Publishing
Abstract:	摘要： The reduction dynamics of micron-sized defects created on chemical vapor deposition- (CVD) grown graphene through scanning probe lithography (SPL) is reported here. CVD-grown graphene was locally oxidized using SPL and subsequently reduced, making use of a focused beam of soft x-rays. During this whole process, the reduction dynamics was monitored using a combination of micro-Raman spectroscopy ( -RS) and micro-x-ray photoelectron spectroscopy ( -XPS). After x-ray reduction, the graphene film was found to be chemically identical ( -XPS) but structurally different ( -RS) from the original graphene. During reduction the population of C-C bonds was found to first increase dramatically and then decrease exponentially. By modeling the dynamics of the C=O → C-O → C-C → C=C reduction process with four coupled-rate equations and three rate constants, the conversion from C-C to C=C bonds was found to be the limiting rate. 其他題名： TDM 其他題名： 2D Mater 出版者： IOP Publishing 出版日期： 2015-08-06 出處： 2d materials, 2015-08, Vol.2 (3), p.31003 資源來源： Institute of Physics Journals 版權： 2015 IOP Publishing Ltd 識別號： ISSN: 2053-1583 識別號： EISSN: 2053-1583 識別號： DOI: 10.1088/2053-1583/2/3/031003
Appears in Collections:	[Department of Physics] journal & Dissertation

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