Interfacial properties at the organic-metal interface probed using quantum well states

Please use this identifier to cite or link to this item: https://ir.lib.ncu.edu.tw/handle/987654321/105081

Title:	Interfacial properties at the organic-metal interface probed using quantum well states
Authors:	林孟凱;Lin, Meng-Kai;Nakayama, Yasuo;Wang, Chin-Yung;Hsu, Jer-Chia;Pan, Chih-Hao;Machida, Shin-ichi;Pi, Tun-Wen;Ishii, Hisao;Tang, S.-J.
Contributors:	理學院物理學系
Keywords:	Condensed matter;Condensed Matter Physics;Dispersions;Electronic, Optical and Magnetic Materials;Fermi level;Film thickness;Interfacial properties;Phase shift;Quantum wells;Silver
Date:	2012-10-31
Issue Date:	2026-04-23 12:06:35 (UTC+8)
Publisher:	American Physical Society;American Physical Society (APS)
Abstract:	摘要： Using angle-resolved photoemission spectroscopy, we investigated the interfacial properties between the long-chain normal-alkane molecule n-CH sub(3) (CH sub(2)) sub(42) CH sub(3) [tetratetracontane (TTC)] and uniform Ag films using the Ag quantum well states. The entire quantum well state energy band dispersions were observed to shift toward the Fermi level with increasing adsorption coverage of TTC up to 1 monolayer (ML). However, the energy shifts upon deposition of 1 ML of TTC are approximately inversely dependent on the Ag film thickness, indicating a quantum-size effect. In the framework of the pushback and image-force models, we applied the Bohr-Sommerfeld quantization rule with the modified Coulomb image potential for the phase shift at the TTC/Ag interface to extract the dielectric constant for 1 ML of TTC. 出版者： American Physical Society (APS) 出版日期： 2012-10-31 出處： Physical Review B, 2012-10, Vol.86 (15), Article 155453 識別號： ISSN: 1098-0121 識別號： EISSN: 1550-235X 識別號： DOI: 10.1103/physrevb.86.155453
Appears in Collections:	[Department of Physics] journal & Dissertation

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