Maximal charge injection of consecutive electron pulses with uniform temporal pulse separation

Please use this identifier to cite or link to this item: https://ir.lib.ncu.edu.tw/handle/987654321/105161

Title:	Maximal charge injection of consecutive electron pulses with uniform temporal pulse separation
Authors:	劉耀澧;Liu, Y. L.;Zhang, P.;Chen, S. H.;Ang, L. K.
Contributors:	理學院物理學系
Keywords:	70 PLASMA PHYSICS AND FUSION TECHNOLOGY;CHARGE DENSITY;Charge injection;Dependence;ELECTRIC POTENTIAL;ELECTRON BEAMS;Electron energy;ELECTRON MICROSCOPY;Electron pulses;ELECTRONS;FREE ELECTRON LASERS;Laser beams;Mathematical models;MEV RANGE;NUMERICAL SOLUTION;Plasma physics;PULSES;Relativistic effects;RELATIVISTIC RANGE;Separation;Sheet modelling;SPACE CHARGE;TIME RESOLUTION
Date:	2015-08-01
Issue Date:	2026-04-23 12:09:00 (UTC+8)
Publisher:	Melville: American Institute of Physics
Abstract:	摘要： A charge sheet model is proposed for the study of the space-charge limited density of consecutive electron pulses injected to in a diode with uniform temporal pulse separation. Based on the model, an analytical formula is derived for expressing the dependency of the charge density limit on the gap spacing, gap voltage, and pulse separation. The theoretical results are verified by numerical solutions up to electron energy of a few MeV, including relativistic effects. The model can be applied to the design of multiple-pulse electron beams for time resolved electron microscopy and free electron lasers. 出版者： Melville: American Institute of Physics 出版日期： 2015-08-01 出處： Physics of plasmas, 2015-08, Vol.22 (8) 資源來源： AIP Journals (American Institute of Physics) 版權： 2015 AIP Publishing LLC. 識別號： ISSN: 1070-664X 識別號： EISSN: 1089-7674 識別號： DOI: 10.1063/1.4928586
Appears in Collections:	[Department of Physics] journal & Dissertation

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