Nanoscale Electron Bunching in Laser-Triggered Ionization Injection in Plasma Accelerators

Please use this identifier to cite or link to this item: https://ir.lib.ncu.edu.tw/handle/987654321/105484

Title:	Nanoscale Electron Bunching in Laser-Triggered Ionization Injection in Plasma Accelerators
Authors:	白植豪;Xu, X. L.;Pai, C.-H.;Zhang, C. J.;Li, F.;Wan, Y.;Wu, Y. P.;Hua, J. F.;Lu, W.;An, W.;Yu, P.;Joshi, C.;Mori, W. B.
Contributors:	理學院物理學系
Keywords:	Acceleration;Beams (radiation);Electron beams;Ionization;Nanostructure;Trapping;Wakes;Wavelengths
Date:	2016-07-15
Issue Date:	2026-04-23 12:30:54 (UTC+8)
Publisher:	American Physical Society;United States: American Physical Society (APS)
Abstract:	摘要： Ionization injection is attractive as a controllable injection scheme for generating high quality electron beams using plasma-based wakefield acceleration. Because of the phase-dependent tunneling ionization rate and the trapping dynamics within a nonlinear wake, the discrete injection of electrons within the wake is nonlinearly mapped to a discrete final phase space structure of the beam at the location where the electrons are trapped. This phenomenon is theoretically analyzed and examined by three-dimensional particle-in-cell simulations which show that three-dimensional effects limit the wave number of the modulation to between >2k_{0} and about 5k_{0}, where k_{0} is the wave number of the injection laser. Such a nanoscale bunched beam can be diagnosed by and used to generate coherent transition radiation and may find use in generating high-power ultraviolet radiation upon passage through a resonant undulator. 其他題名： Phys Rev Lett 出版者： United States: American Physical Society (APS) 出版日期： 2016-07-15 出處： Physical Review Letters, 2016-07, Vol.117 (3), p.034801-034801, Article 034801 資源來源： American Physical Society Journals 識別號： ISSN: 0031-9007 識別號： EISSN: 1079-7114 識別號： DOI: 10.1103/physrevlett.117.034801 識別號： PMID: 27472116
Appears in Collections:	[Department of Physics] journal & Dissertation

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