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| 題名: | Rubrene polycrystalline films growth from vacuum deposition at various substrate temperatures |
| 作者: | 楊仲準;Lin, Ku-Yen;Wang, Yan-Jun;Chen, Ko-Lun;Yang, Chun-Chuen;Ho, Ching-Yuan;Lee, Kueir-Rarn;Shen, Ji-Lin;Chiu, Kuan-Cheng |
| 貢獻者: | 理學院物理學系 |
| 關鍵詞: | A1: Adsorption;A1: Growth models;A1: Morphological stability;A1: X-ray diffraction;A3: Physical vapor deposition processes;B1: Organic compounds;Coherence length;Crystallites;Crystallography;Diffraction;Film growth;Materials Science;Materials Science, Multidisciplinary;Molecular structure;Morphology;Physical Sciences;Physics;Physics, Applied;Science & Technology;Substrates;Technology;Vacuum deposition |
| 日期: | 2016-04-01 |
| 上傳時間: | 2026-04-23 12:44:34 (UTC+8) |
| 出版者: | Elsevier;AMSTERDAM: Elsevier B.V |
| 摘要: | 摘要: Rubrene polycrystalline films growth from vacuum deposition (with a fixed source temperature of 300°C) were characterized with respect to various substrate temperatures (Tsub=103–221°C). First, the growth behavior of these as-deposited polycrystalline films is confirmed to follow an activated surface-adsorption process with an activation energy EA=0.69±0.01eV. A comparison of EA for the growth of some other small organic molecular solid films is given. Then, the surface morphology and the temporal evolution of the grain size in these polycrystalline films with respect to Tsub are described and discussed. Furthermore, by X-ray diffraction, these rubrene crystalline grains are confirmed to have an orthorhombic structure, and the average coherent length and lattice microstrain of the crystallites deposited at high Tsub (189–221°C) are estimated and compared. This experimental work reveals that Tsub has a strong influence on the growth rate, the surface morphology, and the structural properties of the as-deposited rubrene polycrystalline films. •Rubrene solid films fabricated under an activated surface-adsorption process.•Comparing the activation energy of C60, Alq3, rubrene, and CuPc polycrystalline films.•The less spherically symmetric molecule (rubrene) has the higher activation energy.•Properties of rubrene films growth from various substrate temperatures are compared. 出版者: AMSTERDAM: Elsevier B.V 出版日期: 2016-04 出處: Journal of crystal growth, 2016-04, Vol.439, p.54-59 資源來源: Web of Science Primary (SCIE, SSCI & AHCI);Scopus 識別號: ISSN: 0022-0248 識別號: EISSN: 1873-5002 識別號: DOI: 10.1016/j.jcrysgro.2016.01.002 |
| 顯示於類別: | [物理學系] 期刊論文
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