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    Please use this identifier to cite or link to this item: https://ir.lib.ncu.edu.tw/handle/987654321/106342


    Title: A gold-free fully copper metalized AlGaN/GaN power HEMTs on Si substrate
    Authors: 綦振瀛;Chiu, Hsien-Chin;Lin, Chao-Wei;Kao, Hsuan-Ling;Lee, Geng-Yen;Chyi, Jen-Inn;Chuang, Hao-Wei;Chang, Kuo-Jen;Gau, Yau-Tang
    Contributors: 資訊電機學院電機工程學系
    Keywords: Applied sciences;Design. Technologies. Operation analysis. Testing;Electrical engineering. Electrical power engineering;Electronic equipment and fabrication. Passive components, printed wiring boards, connectics;Electronics;Exact sciences and technology;Integrated circuits;Power electronics, power supplies;Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices;Transistors
    Date: 2012-11-01
    Issue Date: 2026-04-23 13:18:15 (UTC+8)
    Publisher: Elsevier Ltd.;Kidlington: Elsevier Ltd
    Abstract: 摘要: The thermal stability and reliability of AlGaN/GaN high electron mobility transistors (HEMTs) on Si substrates with a 2-μm thick copper interconnection (Cu-INTC) were evaluated. The use of metallic copper as a conducting metal has the advantages of higher thermal conductivity, low cost and low sheet resistance. For comparison, traditional gold metal interconnection (Au-INTC) devices were fabricated under the same process conditions. Thermal infrared (IR) microscopy measurements show that the Cu-INTC devices could function at a lower channel temperature (TCHANNEL) than traditional Au-INTC devices with the same drain current density, because of the low resistivity of the metal. The typical peak transconductance (gm), output power (POUT), power gain (Gp) and power-added-efficiency (PAE) during operation at 100°C were 87.53mS/mm, 22.85dBm, 11.1dB and 25.9% for a Cu-INTC power device with gate width of 1mm and these measured results were better than those of Au-INTC devices. They indicate that the copper metal provides great potential for high-power AlGaN/GaN HEMT applications.
    出版者: Kidlington: Elsevier Ltd
    出版日期: 2012-11-01
    出處: Microelectronics and reliability, 2012-11, Vol.52 (11), p.2556-2560
    資源來源: ScienceDirect
    版權: 2012 Elsevier Ltd
    版權: 2015 INIST-CNRS
    識別號: ISSN: 0026-2714
    識別號: DOI: 10.1016/j.microrel.2012.05.010
    識別號: CODEN: MCRLAS
    Appears in Collections:[Department of Electrical Engineering] journal & Dissertation

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