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    Please use this identifier to cite or link to this item: https://ir.lib.ncu.edu.tw/handle/987654321/107041


    Title: Device characteristics of InGaSb/AlSb high-hole-mobility FETs
    Authors: 辛裕明;Ho, Han-Chieh;Gao, Zon-Yan;Lin, Heng-Kuang;Chiu, Pei-Chin;Hsin, Yue-Ming;Chyi, Jen-Inn
    Contributors: 資訊電機學院電機工程學系
    Keywords: Applied sciences;Buffer layers;Compound structure devices;Electronics;Exact sciences and technology;HEMTs;Heterojunction field-effect transistors (HFETs);InGaSb/AlSb;Logic gates;MODFETs;Scattering;Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices;Temperature measurement;Transistors
    Date: 2012-05-22
    Issue Date: 2026-04-23 13:54:06 (UTC+8)
    Publisher: Institute of Electrical and Electronics Engineers Inc.;New York, NY: IEEE
    Abstract: 摘要: This letter reports the effect of growth temperature on carrier transport characteristics in In 0.4 Ga 0.6 Sb/AlSb heterostructure and demonstrates that hole mobility was enhanced by eliminating a parallel conducting channel in the buffer layers. Based on optimized growth conditions, hole mobility as high as 1220 cm 2 /V·s with carrier concentration of 1.3 ×10 12 cm -2 was achieved. A 0.2- μm-gate-length In 0.4 Ga 0.6 Sb/AlSb p-channel device exhibited a maximum drain current of 102 mA/mm, a peak transconductance of 92 mS/mm, and an on-state breakdown voltage over 3 V. The pinchoff was observed for a gate bias of 0.6 V at drain current of 1 mA/mm. The current-gain and power-gain cutoff frequencies were 15 and 20 GHz, respectively.
    其他題名: LED
    出版者: New York, NY: IEEE
    出版日期: 2012-07-01
    出處: IEEE Electron Device Letters, 2012-07, Vol.33 (7), p.964-966
    資源來源: IEEE Xplore (NTUSG)
    版權: 2015 INIST-CNRS
    識別號: ISSN: 0741-3106
    識別號: EISSN: 1558-0563
    識別號: DOI: 10.1109/LED.2012.2193656
    識別號: CODEN: EDLEDZ
    Appears in Collections:[Department of Electrical Engineering] journal & Dissertation

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