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    Please use this identifier to cite or link to this item: https://ir.lib.ncu.edu.tw/handle/987654321/107512


    Title: Improving the off-state characteristics and dynamic on-resistance of AlInN/AlN/GaN HEMTs with a GaN cap layer
    Authors: 綦振瀛;Lee, Geng-Yen;Tu, Po-Tsung;Chyi, Jen-Inn
    Contributors: 資訊電機學院電機工程學系
    Date: 2015-01-01
    Issue Date: 2026-04-23 14:15:58 (UTC+8)
    Publisher: Japan Society of Applied Physics;The Japan Society of Applied Physics
    Abstract: 摘要: The electrical characteristics of a series of AlInN high-electron-mobility transistors (HEMTs) with a GaN cap layer ranging from 0 to 26 nm are investigated for power switching applications. The breakdown voltage (VB), mobility of two-dimensional electron gas, on-state resistance (Ron), and dynamic Ron of the HEMTs are improved by increasing the cap layer thickness. The improved electrical characteristics are attributed to the GaN cap layer, which not only reduces the surface E-field but also raises the conduction band of the barrier layer and effectively prevents electrons from being trapped in the AlInN barrier and above.
    其他題名: Appl. Phys. Express
    出版者: The Japan Society of Applied Physics
    出版日期: 2015-06-01
    出處: Applied physics express, 2015-06, Vol.8 (6), p.64102
    資源來源: Institute of Physics Journals
    版權: 2015 The Japan Society of Applied Physics
    識別號: ISSN: 1882-0778
    識別號: EISSN: 1882-0786
    識別號: DOI: 10.7567/APEX.8.064102
    識別號: CODEN: APEPC4
    Appears in Collections:[Department of Electrical Engineering] journal & Dissertation

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