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    Please use this identifier to cite or link to this item: https://ir.lib.ncu.edu.tw/handle/987654321/107520


    Title: In situ TEM and energy dispersion spectrometer analysis of chemical composition change in ZnO nanowire resistive memories
    Authors: 辛正倫;Huang, Yu-Ting;Yu, Shih-Ying;Hsin, Cheng-Lun;Huang, Chun-Wei;Kang, Chen-Fang;Chu, Fu-Hsuan;Chen, Jui-Yuan;Hu, Jung-Chih;Chen, Lien-Tai;He, Jr-Hau;Wu, Wen-Wei
    Contributors: 資訊電機學院電機工程學系
    Keywords: Analytical chemistry;chemical analysis;chemical composition;computer hardware;energy-dispersive X-ray analysis;Memory;Nanowires;Oxygen;spectrometers;Transmission electron microscopy;zinc;zinc oxide
    Date: 2013-04-16
    Issue Date: 2026-04-23 14:16:14 (UTC+8)
    Publisher: American Chemical Society;United States: American Chemical Society
    Abstract: 摘要: Resistive random-access memory (ReRAM) has been of wide interest for its potential to replace flash memory in the next-generation nonvolatile memory roadmap. In this study, we have fabricated the Au/ZnO-nanowire/Au nanomemory device by electron beam lithography and, subsequently, utilized in situ transmission electron microscopy (TEM) to observe the atomic structure evolution from the initial state to the low-resistance state (LRS) in the ZnO nanowire. The element mapping of LRS showing that the nanowire was zinc dominant indicating that the oxygen vacancies were introduced after resistance switching. The results provided direct evidence, suggesting that the resistance change resulted from oxygen migration.
    其他題名: Anal. Chem
    出版者: United States: American Chemical Society
    出版日期: 2013-04-16
    出處: Analytical Chemistry, 2013-04, Vol.85 (8), p.3955-3960
    資源來源: American Chemical Society (ACS) Journals
    版權: Copyright © 2013 American Chemical Society
    版權: Copyright American Chemical Society Apr 16, 2013
    識別號: ISSN: 0003-2700
    識別號: ISSN: 1520-6882
    識別號: EISSN: 1520-6882
    識別號: DOI: 10.1021/ac303528m
    識別號: PMID: 23461652
    識別號: CODEN: ANCHAM
    Appears in Collections:[Department of Electrical Engineering] journal & Dissertation

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