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    Please use this identifier to cite or link to this item: https://ir.lib.ncu.edu.tw/handle/987654321/107558


    Title: InGaSb/AlSb p-channel HFETs with hydrogen plasma treatment
    Authors: 辛裕明;Ho, Han-Chieh;Gao, Zong-Yan;Lin, Heng-Kuang;Chiu, Pei-Chin;Hsin, Yue-Ming;Chyi, Jen-Inn
    Contributors: 資訊電機學院電機工程學系
    Keywords: aluminium compounds;Applied sciences;Circuit properties;DC performances;Electric, optical and optoelectronic circuits;Electronics;Exact sciences and technology;gallium compounds;gate‐length device;high electron mobility transistors;hydrogen plasma treatment;indium compounds;InGaSb‐AlSb;Microwave circuits, microwave integrated circuits, microwave transmission lines, submillimeter wave circuits;plasma materials processing;p‐channel HFET;Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices;Semiconductor technology;size 0.2 mum;Transistors;voltage 0.47 V to 0 V
    Date: 2013-03-28
    Issue Date: 2026-04-23 14:17:13 (UTC+8)
    Publisher: Institution of Engineering and Technology;Stevenage: The Institution of Engineering and Technology
    Abstract: 摘要: This reported work investigates InGaSb/AlSb p-channel HFETs with hydrogen plasma treatment. The study found that hydrogen plasma treatment can effectively shift threshold voltage from 0.47 to 0 V. A 0.2 µm gate-length device exhibited DC performances of a maximum drain current of 61 mA/mm, and a peak gm of 83 mS/mm.
    出版者: Stevenage: The Institution of Engineering and Technology
    出版日期: 2013-03-28
    出處: Electronics letters, 2013-03, Vol.49 (7), p.499-500
    資源來源: Wiley Online Library Open Access
    版權: The Institution of Engineering and Technology
    版權: 2020 The Institution of Engineering and Technology
    版權: 2014 INIST-CNRS
    識別號: ISSN: 0013-5194
    識別號: ISSN: 1350-911X
    識別號: EISSN: 1350-911X
    識別號: DOI: 10.1049/el.2013.0430
    識別號: CODEN: ELLEAK
    Appears in Collections:[Department of Electrical Engineering] journal & Dissertation

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