Characterization of Fe-Cr alloy metallic interconnects coated with LSMO using the aerosol deposition process

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題名:	Characterization of Fe-Cr alloy metallic interconnects coated with LSMO using the aerosol deposition process
作者:	李雄;Huang, Jian-Jia;Fu, Yen-Pei;Wang, Jian-Yih;Cheng, Yung-Neng;Lee, Shyong;Hsu, Jin-Cherng
貢獻者:	工學院機械工程學系
關鍵詞:	A. Interfaces;AEROSOLS;ALLOYS;C. Electron microscopy;CHROMATES;CHROMIUM OXIDES;D. Diffusion;D. Electrical properties;DEPOSITION;ELECTRIC CONDUCTIVITY;ELECTRON MICROPROBE ANALYSIS;EVAPORATION;LANTHANUM;MATERIALS SCIENCE;MICROSTRUCTURE;OXIDATION;SCANNING ELECTRON MICROSCOPY;STRONTIUM
日期:	2014-03-01
上傳時間:	2026-04-23 14:49:22 (UTC+8)
出版者:	Elsevier Ltd.;United States: Elsevier Ltd
摘要:	摘要： •Lanthanum strontium manganite (LSMO) as the protective layer for metallic interconnects was successfully prepared by aerosol deposition method (AD).•The microstructure, electrical resistance and composition for LSMO-coated Fe–Cr alloys undergoing high temperature, long-hour oxidation were investigated.•The denser protective layer prepared by AD might effectively prohibit the growth of oxidized scale after long time running at 800°C in air. A Fe–Cr alloy, used for metallic interconnects, was coated with a protective layer of lanthanum strontium manganite (LSMO) using the aerosol deposition method (AD). The effects of the LSMO protective layer, which was coated on the Fe–Cr interconnects using AD, on the area specific resistance (ASR) during high temperature oxidation and the Cr evaporation behaviors were systematically investigated in this paper. The microstructures, morphologies, and compositions of the oxidized scales that appeared on the LSMO-coated Fe–Cr alloy after annealing at 800°C for 750h in air were examined using SEM equipped with EDS. The EPMA mapping of the LSMO-coated Fe–Cr interconnects undergoing long term, high-temperature oxidation was used to explain the formation layers of the oxidized scale, which consists of (Mn,Cr)3O4 and Cr2O3 layers. Moreover, the experimental results revealed that the AD process is a potential method for preparing denser protective layers with highly desirable electrical properties for metallic interconnects. 出版者： United States: Elsevier Ltd 出版日期： 2014-03-01 出處： Materials research bulletin, 2014-03, Vol.51, p.63-68 版權： 2013 Elsevier Ltd 識別號： ISSN: 0025-5408 識別號： EISSN: 1873-4227 識別號： DOI: 10.1016/j.materresbull.2013.11.058
顯示於類別:	[機械工程學系] 期刊論文

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