摘要： An optical technique which allows the roughness measurement of sputtered thin film on silicon surface under high rotational speed up to 1500rpm was developed. The rotationally moving effect hinders most in situ optical inspection methods due to the induced disturbance and image aberration, particularly in the circumferential region where the speed reaches the maximum. We present an in situ measurement of surface roughness that is combining on adaptive optics (AO) and binarized analysis of speckle pattern images. The aim of this study was to demonstrate the necessity for AO compensation in regions of moving surfaces under rotating speeds at 750rpm and 1500rpm, respectively. A speckle image was obtained by projecting a laser beam onto the wafer surface, and the laser pattern image reflected from the surface was binarized to experimentally correlate the bright/dark ratio with the surface roughness. The proposed AO-assisted system is in good agreement with the still condition and less than 3.05% error values can be consistently obtained. Furthermore, the proposed system can be used as an in situ roughness measurement on rotating surfaces. Measurement results of five sputtered Pt-film wafers having roughness ranging from 26 to 73nm demonstrate an excellent correlation between the intensity distribution of binarized images and average roughness. Two trend equations can be obtained as Y1=0.2605x−0.997 and Y2=0.1961x−0.905, respectively, for predicting the moving surface roughness of Pt thin film at different moving speeds with repeatable accuracy. The reliability of the AO-integrated technique in obtaining roughness data of surfaces under various speed conditions (from 1.18 to 6.28m/s) was validated and found to be in good agreement with traditional stylus technique. 出版者： Elsevier GmbH 出版日期： 2016-02-01 出處： Optik (Stuttgart), 2016-02, Vol.127 (3), p.1349-1353 資源來源： Elsevier ScienceDirect Journals Complete 版權： 2015 Elsevier GmbH 識別號： ISSN: 0030-4026 識別號： EISSN: 1618-1336 識別號： DOI: 10.1016/j.ijleo.2015.10.056
