Effect of the nanoscratch resistance of indium nitride thin films in the etching duration

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Title:	Effect of the nanoscratch resistance of indium nitride thin films in the etching duration
Authors:	施登士;Hsu, Wen-Nong;Shih, Teng-Shih
Contributors:	工學院機械工程學系
Keywords:	Condensed matter: electronic structure, electrical, magnetic, and optical properties;Condensed matter: structure, mechanical and thermal properties;Cross-disciplinary physics: materials science;rheology;Exact sciences and technology;Friction;Friction, lubrication, and wear;Indium nitride;Materials science;Molecular beam epitaxy;Nanoscratch;Physics;Structure and morphology;thickness;Surfaces and interfaces;thin films and whiskers (structure and nonelectronic properties);Thin film structure and morphology;Treatment of materials and its effects on microstructure and properties
Date:	2012-11-15
Issue Date:	2026-04-23 15:02:55 (UTC+8)
Publisher:	Elsevier;Amsterdam: Elsevier B.V
Abstract:	摘要： ► We evaluated the tribological properties of InN films/AlN buffer/Si. ► The measured values of friction upon increasing the etching duration. ► Low In–N density of InN films at longer etching duration to decay resistance and plastic deformation. This study present the nanotribological behavior of single-crystalline indium nitride (InN) films onto aluminum nitride (AlN) buffer layers on Si(111) substrates. The surface morphology and friction (μ) were analyzed using atomic force microscopy and nanoscratch system. It is confirmed that the normal force (Fn) measured values of μ of the InN films, from 10 to 60min of etching duration, were in the range from 0.2 to 0.43 for Fn=2000μN; 0.25 to 0.58 for Fn=6000μN, respectively. It is suggested that the measured values of μ is slightly increased based on the etching duration due to the etching effect on the grain boundary and reduce film quality of InN films. From morphological observations, we compared the sliding resistance against contact-induced damage of the InN films in the presented ploughed of the area. It is confirmed that the contact sliding line is observable due to the increased Fn, the following investigation with friction curve and lateral force is studied. 出版者： Amsterdam: Elsevier B.V 出版日期： 2012-11-15 出處： Applied surface science, 2012-11, Vol.261, p.610-615 版權： 2012 Elsevier B.V. 版權： 2014 INIST-CNRS 識別號： ISSN: 0169-4332 識別號： EISSN: 1873-5584 識別號： DOI: 10.1016/j.apsusc.2012.08.064
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