Nanoscale silicon surface-assisted laser desorption/ionization mass spectrometry: Environment stability and activation by simple vacuum oven desiccation

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题名:	Nanoscale silicon surface-assisted laser desorption/ionization mass spectrometry: Environment stability and activation by simple vacuum oven desiccation
作者:	曹嘉文;Tsao, Chia-Wen;Lin, Yuan-Jing;Chen, Pi-Yu;Yang, Yu-Liang;Tan, Say Hwa
贡献者:	工學院機械工程學系
关键词:	Desorption;Ionization;Lasers;Nanostructure;Ovens;Silicon;Stability;Surface chemistry
日期:	2016-08-21
上传时间:	2026-04-23 15:18:37 (UTC+8)
出版者:	Royal Society of Chemistry;England
摘要:	摘要： Nanoscale silicon surface-assisted laser desorption/ionization mass spectrometry (SALDI-MS) is an emerging matrix-free, highly sensitive MS analysis method. An important challenge in using nanoscale silicon SALDI-MS analysis is the aging and stability of silicon after storage in various environments. No proper nanoscale silicon SALDI-MS activation procedure has been reported to solve this issue. This study investigated the sensitivity, wettability, and surface oxidation behavior of nanoscale silicon surface SALDI-MS in a room, an inert gas atmosphere, and a vacuum environment. A simple vacuum oven desiccation was proposed to activate the SALDI-MS surface, and the limit of detection was further enhanced 1000 times to a 500 attomole level using this approach. The long-term stability and desorption/ionization mechanism were also investigated. Environmental (air, inert gas, vacuum) stability and vacuum oven desiccation for high sensitivity nanoscale silicon SALDI-MS is investigated. 其他題名： Analyst 出版者： England 出版日期： 2016-08-02 出處： Analyst (London), 2016-08, Vol.141 (16), p.4973-4981 資源來源： Royal Society of Chemistry 識別號： ISSN: 0003-2654 識別號： ISSN: 1364-5528 識別號： EISSN: 1364-5528 識別號： DOI: 10.1039/c6an00659k 識別號： PMID: 27315049
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