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| 題名: | Rapid replication and facile modulation of subwavelength antireflective polymer film using injection nanomolding and optical property of multilayer coatings |
| 作者: | 傅尹坤;Fuh, Yiin-Kuen;Peng, Cheng-Chang;Huang, Chieh-Tse |
| 貢獻者: | 工學院機械工程學系 |
| 關鍵詞: | Chemistry and Materials Science;EMN Meeting;Injection;Materials Science;Molecular Medicine;Nano Express;Nanochemistry;Nanoscale Science and Technology;Nanotechnology;Nanotechnology and Microengineering;Optical properties;Polymers |
| 日期: | 2013-01-01 |
| 上傳時間: | 2026-04-23 15:24:01 (UTC+8) |
| 出版者: | Springer New York;New York: Springer New York |
| 摘要: | 摘要: A rapid, cost-effective and high-throughput process for nanotexturing subwavelength structures with high uniformity using the polycarbonate (PC) is realized via injection nanomolding. The process enables the precise control of nanohole array (NHA) surface topography (nanohole depth, diameter, and periodicity) over large areas thereby presenting a highly versatile platform for fabricating substrates with user-defined, functional performance. Specifically, the optical property of the PC substrates were systematically characterized and tuned through the modulation of the depths of NHA. The aspect ratio submicron holes can be easily modulated and experimentally proven by simply adjusting the molding temperature. The nanotextured depths were reliably fabricated in the range of 200 to 400 nm with a period of approximately 700 nm. The fabricated PC films can reduce the reflectivity from an original bare film of 10.2% and 8.9% to 1.4% and 2.1% with 400-nm depth of nanoholes at the wavelength of 400 and 550 nm, respectively. Compared with conventional moth-like nanostructures with nanopillar arrays with heights adjustable only by an etching process, this paper proposes a facile route with submicron holes to achieve a similar antireflective function, with a significantly reduced time and facile height modulation capability. Furthermore, the effects of multilayer coatings of dielectric and metallic layers on the nanomolded NHA have been performed and potential sensing application is explored. 其他題名: Nanoscale Res Lett 出版者: New York: Springer New York 出版日期: 2013-10-02 出處: Nanoscale research letters, 2013-10, Vol.8 (1), p.407-407, Article 407 資源來源: Publicly Available Content Database 版權: Fuh et al.; licensee Springer. 2013. This article is published under license to BioMed Central Ltd. This is an Open Access article distributed under the terms of the Creative Commons Attribution License ( ), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. 版權: The Author(s) 2013 版權: Copyright © 2013 Fuh et al.; licensee Springer. 2013 Fuh et al.; licensee Springer. 識別號: ISSN: 1556-276X 識別號: ISSN: 1931-7573 識別號: EISSN: 1556-276X 識別號: DOI: 10.1186/1556-276X-8-407 識別號: PMID: 24088185 |
| 顯示於類別: | [機械工程學系] 期刊論文
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