FUZZY ANALYSIS OF THE LINEAR EQUIVALENT FOR FABRICATING A HOLOGRAPHIC OPTICAL-ELEMENT IN PHOTORESIST

NCU Institutional Repository > 理學院 > 光電科學研究所 > 期刊論文 > Item 987654321/28228

jsp.display-item.identifier=請使用永久網址來引用或連結此文件: http://ir.lib.ncu.edu.tw/handle/987654321/28228

题名:	FUZZY ANALYSIS OF THE LINEAR EQUIVALENT FOR FABRICATING A HOLOGRAPHIC OPTICAL-ELEMENT IN PHOTORESIST
作者:	CHANG,RS;LIN,CS;HU,CP
贡献者:	光電科學研究所
关键词:	SURFACE-RELIEF GRATINGS;DEEP
日期:	1995
上传时间:	2010-06-29 19:44:27 (UTC+8)
出版者:	中央大學
摘要:	In this paper fuzzy analysis for economically fabricating a holographic optical element (HOE) in photoresist is conducted. We find that the grating profile has a close relationship with diffraction efficiency, and that the process parameters influence the grating profile significantly. Thus, using the fuzzy control in these relations, it becomes possible to predict the diffraction efficiency and to solve many problems in the grating fabrication process. From the modulation mechanism in these complex holograms we believe we have extracted the necessary and intrinsic qualities, and our model of fuzzy set analysis produces good general agreement with the experimentally measured diffraction efficiency. The new concepts of the ''linear equivalent'' which we established to simplify a HOE from a honeycomb structure to a linear one will be helpful for processing various types of HOEs.
關聯:	JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
显示于类别:	[光電科學研究所] 期刊論文

文件中的档案:

档案	描述	大小	格式	浏览次数
index.html		0Kb	HTML	542	检视/开启

在NCUIR中所有的数据项都受到原著作权保护.

社群 sharing