本論文在探討自含鎂、鎳離子之氮,氮-二甲基甲醯胺(N, N-dimethylformamide DMF)有機鍍液中共鍍鎂、鎳薄膜於銅基材上的可行性。首先添加螯合劑(如檸檬酸及硼酸)至上述電解液中，期望藉由拉近Mg/Ni兩種金屬的還原電位，來共鍍鎂、鎳薄膜。經由電化學陰極動態極化法研究之結果顯示: 在鍍浴中，若陰極電位控制在-0.8VSHE以上時，觀察到氣泡的產升，推測為氫氣產生之反應；電位在-0.8VSHE至-1.3VSHE間，析鍍出具光澤性之金屬，推測為金屬鎳之鍍出；電位在-1.3VSHE以下，析鍍出黑色薄膜，推測為鎂、鎳薄膜之共鍍。 在定電位下進行鎂、鎳薄膜共鍍時，若分別改變DMF鍍液中Mg2+和Ni2+離子濃度，則薄膜鍍層之形貌及其中鎂、鎳組成比例均有變化，鍍膜中的Mg/Ni比例，隨鍍浴中Mg2+濃度增加而增大，但隨Ni2+濃度增加而減小。若鍍浴中Mg2+濃度固定為1.00 M，可由鍍膜中鎂、鎳組成之分析，來推算鍍浴中Mg2+,Ni2+離子之活性係數。在-1.6VSHE與-1.8電位下共鍍鎂、鎳薄膜程序中，其所伴隨之氫氣產生，不僅影響電流效率，亦會影響鍍膜中的Mg/Ni組成比例。 薄膜之儲氫放電容量電化學測試顯示:在含1.00M Mg2+離子和0.10M Ni2+離子DMF鍍浴中，添加0.048 M檸檬酸及0.024 M硼酸下，於-2.2VSHE電位下所得之鍍膜，其儲氫放電容量値最大 (約為150mAh/g)。 Co-deposition of magnesium and nickel from an organic bath of N, N-dimethylformamide containing both these ions onto copper substrate has been investigated. Chelating agent such as citrate was added in the bath to form complex with nickel so that the reduction potentials of Mg and Ni could be pulled closely and make the co-deposition possible. Potentiodynamic polarization on the cathode provided an useful information on the co-deposition. The bubbles evolved at potential higher than -0.8 V were considered as hydrogen gas; the lustered film deposited in the potential from -0.8 to -1.3V was inferred as metallic nickel and the dark film deposited at potential lower than -1.3V was a co-deposition film of Mg-Ni When the co-deposition performed potentiostatically in the DMF, the morphology and composition of the deposit were found to depend on the concentrations of Mg2+ and Ni2+ in the bath. The compositional ratio of Mg to Ni in the deposit increases with increasing the concentration of Mg2+ but decreases with Ni2+ concentrations. For the co-deposition conducted in a DMF solution containing 1.0 M Mg2+, the activity coefficient of Mg and Ni ions could be estimated by virtue of composition analysis on the film. Hydrogen evolution not only affected the current efficiency of the process but also influenced the composition of Mg and Ni in the deposit when the co-deposition of Mg-Ni performed at the potential in between -1.6 and -1.8 V. Hydrogen storage and its discharge capacity in the Mg-Ni binary films could be evaluated using electrochemical method. The Mg-Ni film, deposited at -2.2 V from DMF solution containing 1.0 M Mg2+ and 0.1 M Ni2+ in the presence of 0.48 M citrate and 0.024 M boron acid, revealed the highest capacity in hydrogen storage and discharge DMF solution. analysis demonstrated that the Mg-Ni hydrogen storage thin film exhibited the highest capacity (i.e., 150mAh/cm2) in the hydrogen storage discharge.
