The influence of titanium on the properties of zinc oxide films deposited by radio frequency magnetron sputtering

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Title:	The influence of titanium on the properties of zinc oxide films deposited by radio frequency magnetron sputtering
Authors:	Chung,Jeng-Lin;Chen,Jyh-Chen;Tseng,Chung-Jen
Contributors:	機械工程研究所
Keywords:	CHEMICAL-VAPOR-DEPOSITION;DOPED ZNO FILMS;AL THIN-FILMS;ELECTRICAL-PROPERTIES;OPTICAL-PROPERTIES;SIMULTANEOUS RF;TRANSPARENT;TEMPERATURE;TI;PRESSURE
Date:	2008
Issue Date:	2010-07-06 16:18:10 (UTC+8)
Publisher:	中央大學
Abstract:	TiO2-doped zinc oxide thin films were deposited on glass substrates by radio frequency (RF) magnetron sputtering with TiO2-doped ZnO targets in an argon atmosphere. The structural properties of TiO2-doped ZnO films doped with different TiO2 contents were
Relation:	APPLIED SURFACE SCIENCE?
Appears in Collections:	[Graduate Institute of Mechanical Engineering] journal & Dissertation

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