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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/32300


    Title: Electroreflectance studies of InAs quantum dots with InxGa1-xAs capping layer grown by metalorganic chemical vapor deposition
    Authors: Chang,WH;Chen,HY;Chang,HS;Chen,WY;Hsu,TM;Hsieh,TP;Chyi,JI;Yeh,NT
    Contributors: 電機工程研究所
    Keywords: 1.3 MU-M;DEPENDENCE;EMISSION;SHIFT;LASER
    Date: 2005
    Issue Date: 2010-07-06 18:23:31 (UTC+8)
    Publisher: 中央大學
    Abstract: Electroreflectance spectroscopy was used to study the effect of InxGa1-xAs capping layer on InAs quantum dots grown by metaloiganic chemical vapor deposition. The optical transitions of the quantum dots. and the InxGa1-xAs capping layer were well resolved
    Relation: APPLIED PHYSICS LETTERS
    Appears in Collections:[Graduate Institute of Electrical Engineering] journal & Dissertation

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