English  |  正體中文  |  简体中文  |  Items with full text/Total items : 70585/70585 (100%)
Visitors : 23152466      Online Users : 498
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Tips:
  • please add "double quotation mark" for query phrases to get precise results
  • please goto advance search for comprehansive author search
  • Adv. Search
    HomeLoginUploadHelpAboutAdminister Goto mobile version


    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35420


    Title: Fabrication of high-aspect-ratio sub-diffraction-limit microstructures by two-photon-absorption photopolymerization
    Authors: Pan,EY;Pu,NW;Tong,YP;Yau,HF
    Contributors: 光電科學與工程學系
    Keywords: OPTICAL-DATA STORAGE;MICROFABRICATION;POLYMERIZATION;MICROMACHINES;EXCITATION;DRIVEN;LIGHT
    Date: 2003
    Issue Date: 2010-07-07 14:14:11 (UTC+8)
    Publisher: 中央大學
    Abstract: Micro-cell structures with side-walls as thin as 0.70 mum and aspect ratios as high as 6.7 are fabricated by single-layer writing through two-photon-absorption (TPA) photopolymerization. The use of a moderate-numerical-aperture (N.A.) objective lens to ob
    Relation: APPLIED PHYSICS B-LASERS AND OPTICS
    Appears in Collections:[光電科學與工程學系] 期刊論文

    Files in This Item:

    File Description SizeFormat
    index.html0KbHTML386View/Open


    All items in NCUIR are protected by copyright, with all rights reserved.

    社群 sharing

    ::: Copyright National Central University. | 國立中央大學圖書館版權所有 | 收藏本站 | 設為首頁 | 最佳瀏覽畫面: 1024*768 | 建站日期:8-24-2009 :::
    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback  - 隱私權政策聲明