Process for deposition of AF(3) thin films

NCUIR > Research Center > Thin Film Technology Center > journal & Dissertation > Item 987654321/35656

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35656

Title:	Process for deposition of AF(3) thin films
Authors:	Liao,Bo-Huei;Liu,Ming-Chung;Lee,Cheng-Chung
Contributors:	薄膜技術研究中心
Keywords:	MICROSTRUCTURE-RELATED PROPERTIES;MAGNESIUM FLUORIDE FILMS;193 NM;BOAT EVAPORATION;OPTICAL COATINGS;ULTRAVIOLET;LITHOGRAPHY
Date:	2008
Issue Date:	2010-07-07 15:47:13 (UTC+8)
Publisher:	中央大學
Abstract:	We fabricated aluminum fluoride (AIF(3)) thin films by pulsed DC magnetron sputtering with various CF4 flow rates and sputtering powers. Our method is distinct from the conventional deposition process in that we used inexpensive Al (99.99% purity) as the
Relation:	APPLIED OPTICS
Appears in Collections:	[Thin Film Technology Center] journal & Dissertation

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