AlF3 thin films deposited by reactive magnetron sputtering with Al target

NCUIR > Research Center > Thin Film Technology Center > journal & Dissertation > Item 987654321/35660

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35660

Title:	AlF3 thin films deposited by reactive magnetron sputtering with Al target
Authors:	Lee,Cheng-Chung;Liao,Bo-Huei;Liu,Ming-Chung
Contributors:	薄膜技術研究中心
Keywords:	OPTICAL COATINGS;FLUORIDE FILMS;193 NM;ULTRAVIOLET;LITHOGRAPHY
Date:	2007
Issue Date:	2010-07-07 15:47:19 (UTC+8)
Publisher:	中央大學
Abstract:	Aluminum fluoride thin films have been deposited by magnetron sputtering of an aluminum target with CF4, and CF4 mixed O-2 as the working gas onto a room temperature substrate. The quality of the coated AlF3 film applied with 25W sputtering power using CF
Relation:	OPTICS EXPRESS
Appears in Collections:	[Thin Film Technology Center] journal & Dissertation

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