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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35664


    Title: Simulation of intensity of a patterned thin-film structure
    Authors: Li,Ya-Ping;Lee,Cheng-Chung
    Contributors: 薄膜技術研究中心
    Date: 2007
    Issue Date: 2010-07-07 15:47:25 (UTC+8)
    Publisher: 中央大學
    Abstract: An enhanced thin-film model is proposed to simulate the reflecting intensity of a patterned thin-film structure received by a CCD. This improved thin-film model can be adopted to simulate the intensity profile of a patterned multilayer and diffractive str
    Relation: APPLIED OPTICS
    Appears in Collections:[Thin Film Technology Center] journal & Dissertation

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