Effect of the working gas of the ion-assisted source on the optical and mechanical properties of SiO2 films deposited by dual ion beam sputtering with Si and SiO2 as the starting materials

NCUIR > Research Center > Thin Film Technology Center > journal & Dissertation > Item 987654321/35668

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Title:	Effect of the working gas of the ion-assisted source on the optical and mechanical properties of SiO2 films deposited by dual ion beam sputtering with Si and SiO2 as the starting materials
Authors:	Jean-Yee Wu ,Cheng-Chung Lee
Contributors:	薄膜技術研究中心
Keywords:	SILICON;FILMS
Date:	2006
Issue Date:	2010-07-07 15:47:31 (UTC+8)
Publisher:	中央大學
Abstract:	Silicon and fused-silica targets are used as the starting materials for depositing silicon oxide (SiO2) films. The SiO2 films are prepared by a dual ion beam sputtering deposition system with a main ion source and an ion-assisted source with different wor
Relation:	APPLIED OPTICS
Appears in Collections:	[Thin Film Technology Center] journal & Dissertation

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